Selectivity enhancement of electroless Co deposition for Cu capping process via spontaneous diazonium ion reduction

Electrochemical and Solid-State Letters

Volumn 10, Issue 5, 2007, Pages 43-46

  Chang, S Y ^a   Wan, C C ^a,b   Wang, Y Y ^a  

^a NATIONAL TSING HUA UNIVERSITY   (Taiwan)

^b ELECTROCHEMICAL SOCIETY

Author keywords

[No Author keywords available]

Indexed keywords

CARBON; ELECTRIC RESISTANCE; ELECTROLESS PLATING; INFRARED RADIATION; IONS; REDUCTION; SCANNING ELECTRON MICROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

CAPPING PROCESS; DIAZONIUM ION REDUCTION; ORGANIC MOLECULES; SELECTIVITY ENHANCEMENT;

COPPER;

EID: 33947329491     PISSN: 10990062     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.2709400     Document Type: Article

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