-
1
-
-
34248212800
-
-
10.1002/cphc.200700002
-
C. Klingshirn, ChemPhysChem 8, 782 (2007). 10.1002/cphc.200700002
-
(2007)
ChemPhysChem
, vol.8
, pp. 782
-
-
Klingshirn, C.1
-
2
-
-
16244382410
-
-
10.1002/adma.200400368
-
E. M. C. Fortunato, P. M. C. Barquinha, A. C. M. B. G. Pimentel, A. M. F. Goncalves, A. J. S. Marques, L. M. N. Pereira, and R. F. P. Martins, Adv. Mater. 17, 590 (2005). 10.1002/adma.200400368
-
(2005)
Adv. Mater.
, vol.17
, pp. 590
-
-
Fortunato, E.M.C.1
Barquinha, P.M.C.2
Pimentel, A.C.M.B.G.3
Goncalves, A.M.F.4
Marques, A.J.S.5
Pereira, L.M.N.6
Martins, R.F.P.7
-
3
-
-
78650603687
-
-
10.1007/s00339-010-5973-9
-
T. Yoshida, T. Tachibana, T. Maemoto, S. Sasa, and M. Inoue, Appl. Phys. A 101, 685 (2010). 10.1007/s00339-010-5973-9
-
(2010)
Appl. Phys. A
, vol.101
, pp. 685
-
-
Yoshida, T.1
Tachibana, T.2
Maemoto, T.3
Sasa, S.4
Inoue, M.5
-
5
-
-
0037450269
-
-
10.1063/1.1553997
-
P. F. Carcia, R. S. McLean, M. H. Reilly, and G. Nunes, Appl. Phys. Lett. 82, 1117 (2003). 10.1063/1.1553997
-
(2003)
Appl. Phys. Lett.
, vol.82
, pp. 1117
-
-
Carcia, P.F.1
McLean, R.S.2
Reilly, M.H.3
Nunes, G.4
-
6
-
-
33947251640
-
-
10.1021/ja068876e
-
B. S. Ong, C. Li, Y. Li, Y. Wu, and R. Loutfy, J. Am. Chem. Soc. 129, 2750 (2007). 10.1021/ja068876e
-
(2007)
J. Am. Chem. Soc.
, vol.129
, pp. 2750
-
-
Ong, B.S.1
Li, C.2
Li, Y.3
Wu, Y.4
Loutfy, R.5
-
7
-
-
84859149209
-
-
10.1021/am201656h
-
A. H. Adl, A. Ma, M. Gupta, M. Benlamri, Y. Y. Tsui, D. W. Barlage, and K. Shankar, ACS Appl. Mater. Interfaces 4, 1423 (2012). 10.1021/am201656h
-
(2012)
ACS Appl. Mater. Interfaces
, vol.4
, pp. 1423
-
-
Adl, A.H.1
Ma, A.2
Gupta, M.3
Benlamri, M.4
Tsui, Y.Y.5
Barlage, D.W.6
Shankar, K.7
-
8
-
-
77957927836
-
-
10.1002/adma.201002163
-
K. Song, J. Noh, T. Jun, Y. Jung, H.-Y. Kang, and J. Moon, Adv. Mater. 22, 4308 (2010). 10.1002/adma.201002163
-
(2010)
Adv. Mater.
, vol.22
, pp. 4308
-
-
Song, K.1
Noh, J.2
Jun, T.3
Jung, Y.4
Kang, H.-Y.5
Moon, J.6
-
9
-
-
79955045015
-
-
10.1002/adma.201003935
-
G. Adamopoulos, S. Thomas, P. H. Wöbkenberg, D. D. C. Bradley, M. A. McLachlan, and T. D. Anthopoulos, Adv. Mater. 23, 1894 (2011). 10.1002/adma.201003935
-
(2011)
Adv. Mater.
, vol.23
, pp. 1894
-
-
Adamopoulos, G.1
Thomas, S.2
Wöbkenberg, P.H.3
Bradley, D.D.C.4
McLachlan, M.A.5
Anthopoulos, T.D.6
-
10
-
-
3042595571
-
-
10.1002/pssa.200406798
-
L. Niinistö, M. Nieminen, J. Päiväsaari, J. Niinistö, and M. Putkonen, Phys. Status Solidi A 201, 1443 (2004). 10.1002/pssa.200406798
-
(2004)
Phys. Status Solidi A
, vol.201
, pp. 1443
-
-
Niinistö, L.1
Nieminen, M.2
Päiväsaari, J.3
Niinistö, J.4
Putkonen, M.5
-
13
-
-
76349107815
-
-
10.1109/TED.2009.2037178
-
D. A. Mourey, D. A. Zhao, J. Sun, and T. N. Jackson, IEEE Trans. Electron Devices 57, 530 (2010). 10.1109/TED.2009.2037178
-
(2010)
IEEE Trans. Electron Devices
, vol.57
, pp. 530
-
-
Mourey, D.A.1
Zhao, D.A.2
Sun, J.3
Jackson, T.N.4
-
15
-
-
80052004656
-
-
10.1088/0268-1242/26/8/085007
-
B.-Y. Oh, Y.-H. Kim, H.-J. Lee, B.-Y. Kim, H.-G. Park, J.-W. Han, G.-S. Heo, T.-W. Kim, K.-Y. Kim, and D.-S. Seo, Semicond. Sci. Technol. 26, 085007 (2011). 10.1088/0268-1242/26/8/085007
-
(2011)
Semicond. Sci. Technol.
, vol.26
, pp. 085007
-
-
Oh, B.-Y.1
Kim, Y.-H.2
Lee, H.-J.3
Kim, B.-Y.4
Park, H.-G.5
Han, J.-W.6
Heo, G.-S.7
Kim, T.-W.8
Kim, K.-Y.9
Seo, D.-S.10
-
16
-
-
78651360283
-
-
10.1016/j.apsusc.2010.11.138
-
D. Kim, H. Kang, J.-M. Kim, and H. Kim, Appl. Surf. Sci. 257, 3776 (2011). 10.1016/j.apsusc.2010.11.138
-
(2011)
Appl. Surf. Sci.
, vol.257
, pp. 3776
-
-
Kim, D.1
Kang, H.2
Kim, J.-M.3
Kim, H.4
-
17
-
-
38349143370
-
-
10.1063/1.2830940
-
N. Huby, S. Ferrari, E. Guziewicz, M. Godlewski, and V. Osinniy, Appl. Phys. Lett. 92, 023502 (2008). 10.1063/1.2830940
-
(2008)
Appl. Phys. Lett.
, vol.92
, pp. 023502
-
-
Huby, N.1
Ferrari, S.2
Guziewicz, E.3
Godlewski, M.4
Osinniy, V.5
-
18
-
-
84891399936
-
-
Boston, Massachusetts.
-
P. von Hauff, K. Bothe, A. Afshar, A. Foroughi-Abari, D. W. Barlage, and K. Cadien, in CS Mantech, Boston, Massachusetts, 2012.
-
(2012)
CS Mantech
-
-
Von Hauff, P.1
Bothe, K.2
Afshar, A.3
Foroughi-Abari, A.4
Barlage, D.W.5
Cadien, K.6
-
19
-
-
84879867875
-
-
10.1063/1.4812475
-
P. von Hauff, A. Afshar, A. Foroughi-Abari, K. Bothe, K. Cadien, and D. Barlage, Appl. Phys. Lett. 102, 251601 (2013). 10.1063/1.4812475
-
(2013)
Appl. Phys. Lett.
, vol.102
, pp. 251601
-
-
Von Hauff, P.1
Afshar, A.2
Foroughi-Abari, A.3
Bothe, K.4
Cadien, K.5
Barlage, D.6
-
20
-
-
84878679783
-
-
S. Gieraltowska, L. Wachnicki, B. S. Witkowski, M. Godlewski, and E. Guziewicz, Opt. Appl. 43, 17 (2013).
-
(2013)
Opt. Appl.
, vol.43
, pp. 17
-
-
Gieraltowska, S.1
Wachnicki, L.2
Witkowski, B.S.3
Godlewski, M.4
Guziewicz, E.5
-
21
-
-
84860249607
-
-
10.1109/TED.2012.2189048
-
J. J. Siddiqui, J. D. Phillips, K. Leedy, and B. Bayraktaroglu, IEEE Trans. Electron Devices 59, 1488 (2012). 10.1109/TED.2012.2189048
-
(2012)
IEEE Trans. Electron Devices
, vol.59
, pp. 1488
-
-
Siddiqui, J.J.1
Phillips, J.D.2
Leedy, K.3
Bayraktaroglu, B.4
-
22
-
-
70450214581
-
-
10.1088/0268-1242/24/3/035015
-
S. Kwon, S. Bang, S. Lee, S. Jeon, W. Jeong, H. Kim, S. C. Gong, H. J. Chang, H. Park, and H. Jeon, Semicond. Sci. Technol. 24, 035015 (2009). 10.1088/0268-1242/24/3/035015
-
(2009)
Semicond. Sci. Technol.
, vol.24
, pp. 035015
-
-
Kwon, S.1
Bang, S.2
Lee, S.3
Jeon, S.4
Jeong, W.5
Kim, H.6
Gong, S.C.7
Chang, H.J.8
Park, H.9
Jeon, H.10
-
24
-
-
84864465383
-
-
10.1016/j.sse.2012.05.005
-
A. M. Ma, M. Gupta, F. R. Chowdhury, M. Shen, K. Bothe, K. Shankar, Y. Tsui, and D. W. Barlage, Solid-State Electron. 76, 104 (2012). 10.1016/j.sse.2012.05.005
-
(2012)
Solid-State Electron.
, vol.76
, pp. 104
-
-
Ma, A.M.1
Gupta, M.2
Chowdhury, F.R.3
Shen, M.4
Bothe, K.5
Shankar, K.6
Tsui, Y.7
Barlage, D.W.8
-
27
-
-
84883211508
-
-
10.1007/s00339-012-7154-5
-
M. Gupta, F. R. Chowdhury, D. Barlage, and Y. Y. Tsui, Appl. Phys. A 110, 793 (2013). 10.1007/s00339-012-7154-5
-
(2013)
Appl. Phys. A
, vol.110
, pp. 793
-
-
Gupta, M.1
Chowdhury, F.R.2
Barlage, D.3
Tsui, Y.Y.4
-
28
-
-
77955604253
-
-
10.1002/pssa.200983709
-
G. Luka, T. Krajewski, L. Wachnicki, B. Witkowski, E. Lusakowska, W. Paszkowicz, E. Guziewicz, and M. Godlewski, Phys. Status Solidi 207, 1568 (2010). 10.1002/pssa.200983709
-
(2010)
Phys. Status Solidi
, vol.207
, pp. 1568
-
-
Luka, G.1
Krajewski, T.2
Wachnicki, L.3
Witkowski, B.4
Lusakowska, E.5
Paszkowicz, W.6
Guziewicz, E.7
Godlewski, M.8
-
30
-
-
56349089709
-
-
10.1088/0957-4484/19/43/435609
-
S.-Y. Pung, K.-L. Choy, X. Hou, and C. Shan, Nanotechnology 19, 435609 (2008). 10.1088/0957-4484/19/43/435609
-
(2008)
Nanotechnology
, vol.19
, pp. 435609
-
-
Pung, S.-Y.1
Choy, K.-L.2
Hou, X.3
Shan, C.4
-
32
-
-
78651437575
-
-
1st ed. (Pearson/Prentice Hall, Upper Saddle River, New Jersey)
-
C. Hu, Modern Semiconductor Devices for Integrated Circuits, 1st ed. (Pearson/Prentice Hall, Upper Saddle River, New Jersey, 2010), p. 169.
-
(2010)
Modern Semiconductor Devices for Integrated Circuits
, pp. 169
-
-
Hu, C.1
-
34
-
-
84891411153
-
-
See supplementary material at E-APPLAB-103-021349 for the dynamic characteristics of the Schottky barrier at the source.
-
See supplementary material at http://dx.doi.org/10.1063/1.4836955 E-APPLAB-103-021349 for the dynamic characteristics of the Schottky barrier at the source.
-
-
-
-
37
-
-
0004071496
-
-
3rd ed. (Wiley-IEEE Press, Hoboken, New Jersey)
-
D. K. Schroder, Semiconductor Material and Device Characterization, 3rd ed. (Wiley-IEEE Press, Hoboken, New Jersey, 2006), p. 502.
-
(2006)
Semiconductor Material and Device Characterization
, pp. 502
-
-
Schroder, D.K.1
-
38
-
-
36248989247
-
-
10.1149/1.2801017
-
S. -H. K. Park, C.-S. Hwang, H. Y. Jeong, H. Y. Chu, and K. I. Cho, Electrochem. Solid-State Lett. 11, H10 (2008). 10.1149/1.2801017
-
(2008)
Electrochem. Solid-State Lett.
, vol.11
, pp. 10
-
-
Park, S.-H.K.1
Hwang, C.-S.2
Jeong, H.Y.3
Chu, H.Y.4
Cho, K.I.5
-
39
-
-
77950162866
-
-
R. A. Sporea, X. Guo, J. M. Shannon, and S. R. P. Silva, in IEEE International Semiconductor Conference (2009), pp. 413-416.
-
(2009)
IEEE International Semiconductor Conference
, pp. 413-416
-
-
Sporea, R.A.1
Guo, X.2
Shannon, J.M.3
Silva, S.R.P.4
|