ZnO thin films prepared by atomic layer deposition and rf sputtering as an active layer for thin film transistor

Thin Solid Films

Volumn 516, Issue 7, 2008, Pages 1523-1528

  Lim, S J ^a   Kwon, Soonju ^a   Kim, H ^a  

^a Pohang University of Science and Technology (POSTECH)   (South Korea)

Author keywords

Atomic layer deposition; rf sputtering; Transparent TFT; ZnO

Indexed keywords

ATOMIC LAYER DEPOSITION; GROWTH TEMPERATURE; MICROSTRUCTURE; SPUTTERING; THIN FILM TRANSISTORS; X RAY DIFFRACTION; ZINC OXIDE;

ACTIVE CHANNEL LAYER; METAL PRECURSOR; ROOM TEMPERATURE; TRANSPARENT TFT;

THIN FILMS;

EID: 38649099760     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2007.03.144     Document Type: Article

References (35)

1. Arya S.P.S., and Srivastava O.N. Cryst. Res. Technol. 23 (1988) 669
2. Srivastava J.K., Agrawal L., and Bhattacharyya B. J. Electrochem. Soc. 11 (1989) 3414
3. Jin Z.C., and Granqvist C.G. Proc. SPIE 21 (1987) 827
4. Lee C., Lim K., and Song J. Sol. Energy Mater. Sol. Cells 43 (1996) 37
5. Pearton S.J., Norton D.P., Ip K., Heo Y.W., and Steiner T. Prog. Mater. Sci. 50 (2005) 293
6. Bae H.S., and Im S. Thin Solid Films 469 (2004) 75
7. Hazra S.K., and Basu S. Solid State Electron. 49 (2005) 1158
8. Muthukumar S., Gorla C.R., Emanetoglu N.W., Liang S., and Lu Y. J. Cryst. Growth 225 (2001) 197
9. Assuncao V., Fortunato E., Marques A., Aguas H., Ferreira I., Costa M.E.V., and Martins R. Thin Solid Films 427 (2003) 401
10. Jager S., Szyszka B., Szczyrbowski J., and Bauer G. Surf. Coat. Technol. 98 (1998) 1304
11. Fortunato E., Barquinha P., Pimentel A., Gonçalves A., Marques A., Pereira L., and Martins R. Thin Solid Films 487 (2005) 205
12. Cheng H., Chen C., and Lee C. Thin Solid Films 498 (2006) 142
13. Hoffman R.L. J. Appl. Phys. 95 (2004) 5813
14. Barquinha P., Fortunato E., Gonçalves A., Pimentel A., Marques A., Pereira L., and Martins R. Superlattices Microstruct. 39 (2006) 319
15. Fortunato E., Barguinha P., Pimentel A., Gonçalves A., Marques A., Pereira L., and Martins R. Adv. Mater. 17 (2005) 590
16. Carcia P.F., McLean R.S., Reilly M.H., and Nunes Jr. G. Appl. Phys. Lett. 82 (2003) 1117
17. Masuda S., Kitamura K., Okumura Y., and Miyatake S. J. Appl. Phys. 93 (2003) 1624
18. Ohyam Y., Niwa T., Ban T., and Takahashi Y. Jpn. J. Appl. Phys. 297 (2001) 40
19. Banerjee A.N., Ghosh C.K., Chattopadhyay K.K., Minoura H., Sarkar A., Akiba A., Kamiya A., and Endo T. Thin Solid Films 496 (2006) 112
20. Kim H. J. Vac. Sci. Technol., B 21 (2003) 2231
21. Yamada A., Sang B., and Konagai M. Appl. Surf. Sci. 112 (1997) 216
22. Lujala V., Skarp J., Tammenmaa M., and Suntola T. Appl. Surf. Sci. 82-83 (1994) 34
23. Yousfi E., Fouache J., and Lincot D. Appl. Surf. Sci. 153 (2000) 223
24. Ott A.W., and Chang R.P.H. Mater. Chem. Phys. 58 (1999) 132
25. Kim S.K., Hwang C.S., Ko Park S., and Yun S.J. Thin Solid Films 478 (2005) 103
26. Matero R., Rhatu A., Ritala M., Leskela M., and Sajavaara T. Thin Solid Films 368 (2000) 1
27. Pruunen R.L. J. Appl. Phys. 97 (2005) 121301
28. Yamamoto Y., Saito K., Takahashi K., and Konagai M. Sol. Energy Mater. Sol. Cells 65 (2001) 125
29. Ko Park S.-H., and Lee Y.E. J. Mater. Sci. 39 (2004) 2195
30. Islam M., Glosh T.B., Chopra K.L., and Acharya H.N. Thin Solid Films 280 (1996) 20
31. Chen M., Wang X., Yu Y.H., Pei Z.L., Bai X.D., Sun C., Huang R.F., and Wen L.S. Appl. Surf. Sci. 158 (2000) 134
32. Zhang Y., Du G., Wang X., Li W., Yang X., Ma Y., Zhao B., Yang H., Liu D., and Yang S. J. Cryst. Growth 252 (2003) 180
33. Coppa B.J., and Davis R.F. Appl. Phys. Lett. 82 (2003) 400
34. Zhou Z., Kato K., Komaki T., Yoshino M., Yakawa H., and Morinaga M. Int. J. Hydrogen Energy 29 (2004) 323
35. Özgür Ü., Alivov I., Liu C., Teke A., Reshchikov M.A., Dogan S., Avrutin V., Cho S.-J., and Mokoç H. J. Appl. Phys. 98 (2005) 041301