Transparent and conductive undoped zinc oxide thin films grown by atomic layer deposition

Physica Status Solidi (A) Applications and Materials Science

Volumn 207, Issue 7, 2010, Pages 1568-1571

  Luka, Grzegorz ^a   Krajewski, Tomasz ^a   Wachnicki, Lukasz ^a   Witkowski, Bartlomiej ^b   Lusakowska, Elzbieta ^a   Paszkowicz, Wojciech ^a   Guziewicz, Elzbieta ^a   Godlewski, Marek ^b  

^a INSTITUTE OF PHYSICS   (Poland)

^b CARDINAL STEFAN WYSZY SKI UNIVERSITY   (Poland)

Author keywords

Atomic layer deposition; Electrical properties; Morphology; Optical properties; Structure; ZnO

Indexed keywords

DIETHYLZINC; ELECTRICAL MEASUREMENT; ELECTRICAL PROPERTY; FILM PARAMETERS; GLASS SUBSTRATES; GROUP III; GROWTH CONDITIONS; HIGH ELECTRICAL CONDUCTIVITY; LOW GROWTH TEMPERATURE; OXYGEN PRECURSORS; PROCESS TECHNOLOGIES; STRUCTURE; ZINC OXIDE THIN FILMS; ZNO; ZNO FILMS;

ATOMIC LAYER DEPOSITION; ATOMS; CARRIER CONCENTRATION; CONDUCTIVE FILMS; DEIONIZED WATER; DEPOSITION; ELECTRIC CONDUCTIVITY; MORPHOLOGY; OXIDE FILMS; OXYGEN; STOICHIOMETRY; SUBSTRATES; SURFACE STRUCTURE; THIN FILMS; ZINC; ZINC OXIDE;

OPTICAL PROPERTIES;

EID: 77955604253     PISSN: 18626300     EISSN: 18626319     Source Type: Journal    
DOI: 10.1002/pssa.200983709     Document Type: Article

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