Highly stable ultrathin carbosiloxane films by molecular layer deposition

Journal of Physical Chemistry C

Volumn 117, Issue 39, 2013, Pages 19967-19973

  Zhou, Han ^a   Bent, Stacey F ^a  

^a Stanford University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CONSTANT GROWTH RATES; FILM COMPOSITION; FOURIER TRANSFORM INFRA REDS; MOLECULAR LAYER DEPOSITION; MOLECULAR LAYER DEPOSITIONS (MLD); SATURATION BEHAVIOR; THERMAL STABILITY STUDIES; VIBRATIONAL ABSORPTION;

ATOMIC LAYER DEPOSITION; DEPOSITION; OZONE; PHOTOELECTRONS; SPECTROSCOPIC ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

ULTRATHIN FILMS;

EID: 84885099026     PISSN: 19327447     EISSN: 19327455     Source Type: Journal    
DOI: 10.1021/jp4058725     Document Type: Article

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