Chemical-mechanical polishing of SiOC organosilicate glasses: The effect of film carbon content

Thin Solid Films

Volumn 385, Issue 1-2, 2001, Pages 281-292

  Borst, Christopher L ^a,b   Korthuis, Vincent ^b   Shinn, Gregory B ^b   Luttmer, J D ^b   Gutmann, Ronald J ^a   Gill, William N ^a  

^a RENSSELAER POLYTECHNIC INSTITUTE   (United States)

^b TEXAS INSTRUMENTS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL ATTACK; CHEMICAL MECHANICAL POLISHING; HYDROPHOBICITY; PERMITTIVITY; PH EFFECTS; SILICA; SLURRIES; SURFACE ROUGHNESS;

FILM CARBON CONTENT; ORGANOSILICATE GLASSES;

GLASS;

EID: 0035311224     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(00)01925-8     Document Type: Article

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