Molecular layer deposition of aluminum alkoxide polymer films using trimethylaluminum and glycidol

Langmuir

Volumn 27, Issue 24, 2011, Pages 15155-15164

  Lee, Younghee ^a   Yoon, Byunghoon ^a   Cavanagh, Andrew S ^a   George, Steven M ^a,b  

^a UNIVERSITY OF COLORADO   (United States)

^b UCB 450   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM ALKOXIDES; ANNEALING TEMPERATURES; FOURIER TRANSFORM INFRARED; FTIR MEASUREMENTS; GLYCIDOL; GROWTH CONDITIONS; HYDROXYL GROUPS; IN-SITU; LEWIS ACID-BASE INTERACTION; LINEAR GROWTH; MASS GAIN; METHYL TRANSFERS; MOLECULAR LAYER DEPOSITION; POROUS FILM; PURGE TIME; REACTANT EXPOSURES; RING OPENING; RING OPENING REACTION; SELECTIVE REACTIONS; SURFACE SPECIES; TRIMETHYLALUMINUM;

ALUMINUM; ALUMINUM COATINGS; ECOLOGY; FILM GROWTH; QUARTZ; QUARTZ CRYSTAL MICROBALANCES; SELF ASSEMBLY; STOICHIOMETRY; SURFACE REACTIONS;

POLYMER FILMS;

EID: 83455238713     PISSN: 07437463     EISSN: 15205827     Source Type: Journal    
DOI: 10.1021/la202391h     Document Type: Article

References (52)

1. George, S. M.; Yoon, B.; Dameron, A. A. Acc. Chem. Res. 2009, 42, 498
2. George, S. M. Chem. Rev. 2010, 110, 111
3. Adamczyk, N. M.; Dameron, A. A.; George, S. M. Langmuir 2008, 24, 2081
4. Du, Y.; George, S. M. J. Phys. Chem. C 2007, 111, 8509
5. Shao, H. I.; Umemoto, S.; Kikutani, T.; Okui, N. Polymer 1997, 38, 459
6. Putkonen, M.; Harjuoja, J.; Sajavaara, T.; Niinisto, L. J. Mater. Chem. 2007, 17, 664
7. Yoshimura, T.; Tatsuura, S.; Sotoyama, W. Appl. Phys. Let.t 1991, 59, 482
8. Kim, A.; Filler, M. A.; Kim, S.; Bent, S. F. J. Am. Chem. Soc. 2005, 127, 6123
9. Loscutoff, P. W.; Zhou, H.; Clendenning, S. B.; Bent, S. F. ACS Nano 2010, 4, 331
10. Cho, S.; Han, G.; Kim, K.; Sung, M. M. Angew. Chem., Int. Ed. 2011, 50, 2742
11. Dameron, A. A.; Seghete, D.; Burton, B. B.; Davidson, S. D.; Cavanagh, A. S.; Bertrand, J. A.; George, S. M. Chem. Mater. 2008, 20, 3315
12. Klepper, K. B.; Nilsen, O.; Fjellvag, H. Dalton Trans. 2010, 39, 11628
13. Klepper, K. B.; Nilsen, O.; Hansen, P. A.; Fjellvag, H. Dalton Trans. 2011, 40, 4636
14. Lee, B. H.; Ryu, M. K.; Choi, S. Y.; Lee, K. H.; Im, S.; Sung, M. M. J. Am. Chem. Soc. 2007, 129, 16034
15. Li, Y. H.; Wang, D.; Buriak, J. M. Langmuir 2010, 26, 1232
16. Peng, Q.; Gong, B.; VanGundy, R. M.; Parsons, G. N. Chem. Mater. 2009, 21, 820
17. Yoon, B.; O'Patchen, J. L.; Seghete, D.; Cavanagh, A. S.; George, S. M. Chem. Vap. Deposition 2009, 15, 112
18. Yoon, B.; Seghete, D.; Cavanagh, A. S.; George, S. M. Chem. Mater. 2009, 21, 5365
19. Seghete, D.; Hall, R. A.; Yoon, B.; George, S. M. Langmuir 2010, 26, 19045
20. Hall, R. A.; Lee, Y.; Yoon, B.;; George, S. M., Molecular Layer Deposition of Hybrid Organic-Inorganic Films Using Trimethylaluminum and Sugar Alcohols; and Geng, B.; Peng, Q.; Parsons, G. N., A Two-Step Lewis Acid-Catalyzed Epoxide Ring-Opening MLD Process for Stable Hybrid Organic-Aluminum Oxide Films. Both talks were presented at the 10th International Conference on Atomic Layer Deposition (ALD2010); Seoul, Korea; June 23, 2010.
21. Hall, R. A.; Yoon, B.; Lee, Y.;; George, S. M.; Molecular Layer Deposition Using Trimethylaluminum and Glycerol or Glycidol; AVS 57th International Symposium; Albuquerque, New Mexico; October 18, 2010.
22. Gong, B.; Peng, Q.; Parsons, G. N. J. Phys. Chem. B 2011, 115, 5930
23. Gong, B.; Peng, Q.; Parsons, G. N. J. Phys. Chem. B 2011, 115, 11028
24. Ballinger, T. H.; Wong, J. C. S.; Yates, J. T. Langmuir 1992, 8, 1676
25. Ferguson, J. D.; Weimer, A. W.; George, S. M. Thin Solid Films 2000, 371, 95
26. Elam, J. W.; Groner, M. D.; George, S. M. Rev. Sci. Instrum. 2002, 73, 2981
27. Johs, B.; Hale, J. S. Phys. Status Solidi A 2008, 205, 715
28. Boiadjiev, V.; Tysoe, W. T. Chem. Mater. 1998, 10, 334
29. Buckley, P.; Giguere, P. A. Can. J. Chem. 1967, 45, 397
30. Badawi, H. M.; Ali, S. A. Spectrochim. Acta, Part A 2009, 74, 558
31. Lynch, C. T.; Mazdiyasni, K. S.; Crawford, W. J.; Smith, J. S. Anal. Chem. 1964, 36, 2332
32. Lehmann, W. J.; Weiss, H. G.; Shapiro, I. J. Chem. Phys. 1959, 30, 1226
33. Stacchiola, D.; Burkholder, L.; Tysoe, W. T. J. Am. Chem. Soc. 2002, 124, 8984
34. Tobin, M. C. Spectrochim. Acta 1960, 16, 1108
35. Quinan, J. R.; Wiberley, S. E. Anal. Chem. 1954, 26, 1762
36. Infrared Spectra by NIST Mass Spec Data Center, S. E. Stein, director, in NIST Chemistry WebBook, NIST Standard Reference Database Number 69, Linstrom, P. J.;; Mallard, W. G., Eds.; National Institute of Standards and Technology, Gaithersburg, MD, 20899; http:nist.gov.
37. Silverstein, R. M.; Bassler, G. C.; Morrill, T. C. Spectrometric Identification of Organic Compounds, 5 th ed.; Wiley: New York, 1991.
38. Suzuki, T.; Saimoto, H.; Tomioka, H.; Oshima, K.; Nozaki, H. Tetrahedron Lett. 1982, 23, 3597
39. Lundeen, A. J.; Oehlschl, A. C. J. Organomet. Chem. 1970, 25, 337
40. Kuran, W.; Pasynkie., S; Serzyko, J. J. Organomet. Chem. 1974, 73, 187
41. Schneider, C.; Brauner, J. Eur. J. Org. Chem. 2001, 4445
42. Yamada, A.; Sang, B. S.; Konagai, M. Appl. Surf. Sci. 1997, 112, 216
43. Yousfi, E. B.; Fouache, J.; Lincot, D. Appl. Surf. Sci. 2000, 153, 223
44. Knochel, P.; Perea, J. J. A.; Jones, P. Tetrahedron 1998, 54, 8275
45. Elam, J. W.; George, S. M. Chem. Mater. 2003, 15, 1020
46. Rogers, J. H.; Apblett, A. W.; Cleaver, W. M.; Tyler, A. N.; Barron, A. R. J. Chem. Soc., Dalton Trans. 1992, 3179
47. van Poppel, L. H.; Bott, S. G.; Barron, A. R. J. Chem. Soc., Dalton Trans. 2002, 3327
48. Liang, X. H.; Yu, M.; Li, J. H.; Jiang, Y. B.; Weimer, A. W. Chem. Commun. 2009, 7140
49. Yu, M.; Funke, H. H.; Noble, R. D.; Falconer, J. L. J. Am. Chem. Soc. 2011, 133, 1748
50. Liang, X.; King, D. M.; Li, P.; George, S. M.; Weimer, A. W. AIChE J. 2009, 55, 1030
51. Holy, V.; Pietsch, U.; Baumbach, T. High Resolution X-ray Scattering from Thin Films and Multilayers; Springer-Verlag: Berlin, 1999.
52. Phung, T. M.; Jensen, J. M.; Johnson, D. C.; Donovan, J. J.; McBurnett, B. G. X-Ray Spectrom. 2008, 37, 608