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Volumn 137, Issue 1-3, 1999, Pages 179-183

A study of HMDSO/O 2 plasma deposits using a high-sensitivity and -energy resolution XPS instrument: Curve fitting of the Si 2p core level

Author keywords

Curve fitting; HMDSO; Plasma; XPS

Indexed keywords

BINDING ENERGY; CHEMICAL BONDS; CURVE FITTING; MICROWAVES; OXYGEN; PLASMA SPRAYING; SILICON COMPOUNDS; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 0032761517     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(98)00479-6     Document Type: Article
Times cited : (315)

References (7)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.