Repair and capping of porous MSQ films using chlorosilanes and supercritical CO 2

Microelectronic Engineering

Volumn 80, Issue SUPPL., 2005, Pages 349-352

  Xie, B ^a   Choate, L ^a   Muscat, A J ^a  

^a University of Arizona   (United States)

Author keywords

Capping; DMDCS; MTCS; Porous MSQ; Repair; Supercritical carbon dioxide; Ti CVD; TMCS

Indexed keywords

CAPPING; DIMETHYLDICHLOROSILANE (DMDCS); METHYLTRICHLOROSILANE (MTCS); POROUS MSQ; SUPERCRITICAL CARBON DIOXIDE; TICVD; TRIMETHYLCHLOROSILANE (TMCS);

CARBON DIOXIDE; CHEMICAL VAPOR DEPOSITION; ELECTRIC VARIABLES MEASUREMENT; ELLIPSOMETRY; FOURIER TRANSFORM INFRARED SPECTROSCOPY; OXYGEN; PERMITTIVITY; REACTION KINETICS; REPAIR; SILANES; SUPERCRITICAL FLUIDS; X RAY PHOTOELECTRON SPECTROSCOPY;

POROUS MATERIALS;

EID: 19944372735     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2005.04.090     Document Type: Conference Paper

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