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Volumn 6, Issue 9, 2013, Pages 3710-3726

Single layer broadband anti-reflective coatings for plastic substrates produced by full wafer and roll-to-roll step-and-flash nano-imprint lithography

Author keywords

Anti reflective; Coating; Durability; Moth eye; Nano imprint lithography; Roll to roll

Indexed keywords

ACCELERATED AGEING TESTS; ANTI REFLECTIVE COATINGS; ANTI-REFLECTIVE; LARGE-SCALE PRODUCTION; MOTH EYE; POLYETHYLENE TEREPHTHALATES (PET); REFLECTION OF LIGHT; ROLL TO ROLL;

EID: 84884578195     PISSN: None     EISSN: 19961944     Source Type: Journal    
DOI: 10.3390/ma6093710     Document Type: Article
Times cited : (48)

References (62)
  • 2
    • 0035372224 scopus 로고    scopus 로고
    • Anti-reflection (AR) coatings made by sol-gel processes: A review
    • Chen, D. Anti-reflection (AR) coatings made by sol-gel processes: A review. Sol. Energy Mater. Sol. Cells 2001, 68, 313-336.
    • (2001) Sol. Energy Mater. Sol. Cells , vol.68 , pp. 313-336
    • Chen, D.1
  • 3
    • 0035848853 scopus 로고    scopus 로고
    • Optical polymer thin films with isotropic and anisotropic nano-corrugated surface topologies
    • Ibn-Elhaj, M.; Schadt, M. Optical polymer thin films with isotropic and anisotropic nano-corrugated surface topologies. Nature 2001, 410, 796-799.
    • (2001) Nature , vol.410 , pp. 796-799
    • Ibn-Elhaj, M.1    Schadt, M.2
  • 5
    • 0037400979 scopus 로고    scopus 로고
    • Scratch and abrasion resistant coatings on plastic lenses-State of the art, current developments and perspectives
    • Schottner, G.; Rose, K.; Posset, U. Scratch and abrasion resistant coatings on plastic lenses-State of the art, current developments and perspectives. J. Sol-Gel Sci. Technol. 2003, 27, 71-79.
    • (2003) J. Sol-Gel Sci. Technol. , vol.27 , pp. 71-79
    • Schottner, G.1    Rose, K.2    Posset, U.3
  • 8
    • 75149197680 scopus 로고    scopus 로고
    • Enhancement of the light conversion efficiency of silicon solar cells by using nanoimprint anti-reflection layer
    • Chen, J.J.; Sun, K.W. Enhancement of the light conversion efficiency of silicon solar cells by using nanoimprint anti-reflection layer. Sol. Energy Mater. Sol. Cells 2010, 94, 629-633.
    • (2010) Sol. Energy Mater. Sol. Cells , vol.94 , pp. 629-633
    • Chen, J.J.1    Sun, K.W.2
  • 10
    • 79960484277 scopus 로고    scopus 로고
    • Simultaneous efficiency enhancement and self-cleaning effect of white organic light-emitting devices by flexible antireflection films
    • Wu, D.; Zhao, Y.B.; Wu, S.Z.; Liu, Y.F.; Zheng, H.; Zhao, S.; Feng, J.; Chen, Q.D.; Ma, D.G.; Sun, H.B. Simultaneous efficiency enhancement and self-cleaning effect of white organic light-emitting devices by flexible antireflection films. Opt. Lett. 2011, 36, 2635-2637.
    • (2011) Opt. Lett. , vol.36 , pp. 2635-2637
    • Wu, D.1    Zhao, Y.B.2    Wu, S.Z.3    Liu, Y.F.4    Zheng, H.5    Zhao, S.6    Feng, J.7    Chen, Q.D.8    Ma, D.G.9    Sun, H.B.10
  • 11
    • 8444248966 scopus 로고    scopus 로고
    • Characterization of SiO2 and TiO2 films prepared using rf magnetron sputtering and their application to anti-reflection coating
    • Jeong, S.H.; Kim, J.K.; Kim, B.S.; Shim, S.H.; Lee, B.T. Characterization of SiO2 and TiO2 films prepared using rf magnetron sputtering and their application to anti-reflection coating. Vacuum 2004, 76, 507-515.
    • (2004) Vacuum , vol.76 , pp. 507-515
    • Jeong, S.H.1    Kim, J.K.2    Kim, B.S.3    Shim, S.H.4    Lee, B.T.5
  • 12
    • 0036236506 scopus 로고    scopus 로고
    • Two-layer hybrid anti-reflection film prepared on plastic substrates
    • Kim, J.Y.; Han, Y.K.; Kim, E.R.; Suh, K.S. Two-layer hybrid anti-reflection film prepared on plastic substrates. Curr. Appl. Phys. 2002, 2, 123-127.
    • (2002) Curr. Appl. Phys. , vol.2 , pp. 123-127
    • Kim, J.Y.1    Han, Y.K.2    Kim, E.R.3    Suh, K.S.4
  • 13
    • 84861662642 scopus 로고    scopus 로고
    • Antireflective coatings prepared by sol-gel processing: Principles and applications
    • Glaubitt, W.; Löbmann, P. Antireflective coatings prepared by sol-gel processing: Principles and applications. J. Eur. Ceram. Soc. 2012, 32, 2995-2999.
    • (2012) J. Eur. Ceram. Soc. , vol.32 , pp. 2995-2999
    • Glaubitt, W.1    Löbmann, P.2
  • 14
    • 35348990317 scopus 로고    scopus 로고
    • Functionalized sol-gel coatings for optical applications
    • Pénard, L.; Gacoin, T.; Boilot, J.P. Functionalized sol-gel coatings for optical applications. Acc. Chem. Res. 2007, 40, 895-902.
    • (2007) Acc. Chem. Res. , vol.40 , pp. 895-902
    • Pénard, L.1    Gacoin, T.2    Boilot, J.P.3
  • 15
    • 0013006269 scopus 로고    scopus 로고
    • Reversibly erasable nanoporous anti-reflective coatings from polyelectrolyte multilayers
    • Hiller, J.; Mendelsohn, J.D.; Rubner, M.F. Reversibly erasable nanoporous anti-reflective coatings from polyelectrolyte multilayers. Nat. Mater. 2002, 1, 59-63.
    • (2002) Nat. Mater. , vol.1 , pp. 59-63
    • Hiller, J.1    Mendelsohn, J.D.2    Rubner, M.F.3
  • 16
    • 77955537864 scopus 로고    scopus 로고
    • Hollow silica nanoparticles in UV-Visible antireflection coatings for poly(methyl methacrylate) substrates
    • Du, Y.; Luna, L.E.; Tan, W.S.; Rubner, M.F.; Cohen, R.E. Hollow silica nanoparticles in UV-Visible antireflection coatings for poly(methyl methacrylate) substrates. ACS Nano 2010, 4, 4308-4316.
    • (2010) ACS Nano , vol.4 , pp. 4308-4316
    • Du, Y.1    Luna, L.E.2    Tan, W.S.3    Rubner, M.F.4    Cohen, R.E.5
  • 19
    • 0015840393 scopus 로고
    • Reduction of lens reflexion by the 'moth eye' principle
    • Clapham, P.B.; Hutley, M.C. Reduction of lens reflexion by the 'moth eye' principle. Nature 1973, 244, 281-282.
    • (1973) Nature , vol.244 , pp. 281-282
    • Clapham, P.B.1    Hutley, M.C.2
  • 20
    • 2442490755 scopus 로고    scopus 로고
    • Optical elements with subwavelength structured surfaces
    • Kikuta, H.; Toyota, H.; Yu, W. Optical elements with subwavelength structured surfaces. Opt. Rev. 2003, 10, 63-73.
    • (2003) Opt. Rev. , vol.10 , pp. 63-73
    • Kikuta, H.1    Toyota, H.2    Yu, W.3
  • 21
    • 53349099547 scopus 로고    scopus 로고
    • Tunable reflection minima of nanostructured antireflective surfaces
    • 133108 1-133108: 3
    • Boden, S.A.; Bagnall, D.H. Tunable reflection minima of nanostructured antireflective surfaces. Appl. Phys. Lett. 2008, 93, 133108:1-133108:3.
    • (2008) Appl. Phys. Lett. , vol.93
    • Boden, S.A.1    Bagnall, D.H.2
  • 22
    • 67651124701 scopus 로고    scopus 로고
    • Simple approach to wafer-scale self-cleaning anti-reflective silicon surfaces
    • Ai, D.; Lu, W.; Xu, H.; Yang, B.; Huang, C.; Xu, M.; Gao, L.; Weng, Z.; Chi, L. Simple approach to wafer-scale self-cleaning anti-reflective silicon surfaces. Langmuir 2009, 25, 7769-7772.
    • (2009) Langmuir , vol.25 , pp. 7769-7772
    • Ai, D.1    Lu, W.2    Xu, H.3    Yang, B.4    Huang, C.5    Xu, M.6    Gao, L.7    Weng, Z.8    Chi, L.9
  • 23
    • 42449107411 scopus 로고    scopus 로고
    • Low cost fabrication of large-area anti-reflection films from polymer by nanoimprint/hot embossing technology
    • 205501 1-205501: 20
    • Ting, C.J.; Huang, M.C.; Tsai, H.Y.; Chou, C.P.; Fu, E.C. Low cost fabrication of large-area anti-reflection films from polymer by nanoimprint/hot embossing technology. Nanotechnology 2008, 19, 205501:1-205501:20.
    • (2008) Nanotechnology , vol.19
    • Ting, C.J.1    Huang, M.C.2    Tsai, H.Y.3    Chou, C.P.4    Fu, E.C.5
  • 24
    • 0142037327 scopus 로고
    • Imprint of sub-25 nm vias and trenches in polymers
    • Chou, S.Y.; Krauss, P.R.; Renstrom, P.J. Imprint of sub-25 nm vias and trenches in polymers. Appl. Phys. Lett. 1995, 67, 3114-3116.
    • (1995) Appl. Phys. Lett. , vol.67 , pp. 3114-3116
    • Chou, S.Y.1    Krauss, P.R.2    Renstrom, P.J.3
  • 25
    • 0030570065 scopus 로고    scopus 로고
    • Imprint lithography with 25 nm resolution
    • Chou, S.Y.; Krauss, P.R.; Renstrom, P.J. Imprint lithography with 25 nm resolution. Science 1996, 272, 85-87.
    • (1996) Science , vol.272 , pp. 85-87
    • Chou, S.Y.1    Krauss, P.R.2    Renstrom, P.J.3
  • 27
    • 18044384992 scopus 로고    scopus 로고
    • New approaches to nanofabrication: Molding, printing and other techniques
    • Gates, B.D.; Xu, Q.; Stewart, M.; Ryan, D.; Willson, C.G.; Whitesides, G.H. New approaches to nanofabrication: Molding, printing and other techniques. Chem. Rev. 2005, 105, 1171-1196.
    • (2005) Chem. Rev. , vol.105 , pp. 1171-1196
    • Gates, B.D.1    Xu, Q.2    Stewart, M.3    Ryan, D.4    Willson, C.G.5    Whitesides, G.H.6
  • 29
    • 2942558559 scopus 로고    scopus 로고
    • Recent progress in nanoimprint technology and its applications
    • R123:1-R123: 11
    • Guo, L.J.; Phys, J. Recent progress in nanoimprint technology and its applications. J. Phys. D Appl. Phys. 2004, 37, R123:1-R123:11.
    • (2004) J. Phys. D Appl. Phys. , vol.37
    • Guo, L.J.1    Phys, J.2
  • 32
    • 34248397564 scopus 로고    scopus 로고
    • Micro- and nanopatterning techniques for organic electronic and opto-electronic systems
    • Menard, E.; Meitl, M.A.; Sun, Y.; Park, J.U.; Shir, D.J.L.; Nam, Y.S.; Jeon, S.; Rogers, J.A. Micro- and nanopatterning techniques for organic electronic and opto-electronic systems. Chem. Rev. 2007, 107, 1117-1160.
    • (2007) Chem. Rev. , vol.107 , pp. 1117-1160
    • Menard, E.1    Meitl, M.A.2    Sun, Y.3    Park, J.U.4    Shir, D.J.L.5    Nam, Y.S.6    Jeon, S.7    Rogers, J.A.8
  • 33
    • 0035902004 scopus 로고    scopus 로고
    • Room-temperature imprint lithography
    • Khang, D.Y.; Yoon, H.; Lee, H.H. Room-temperature imprint lithography. Adv. Mater. 2001, 13, 749-752.
    • (2001) Adv. Mater. , vol.13 , pp. 749-752
    • Khang, D.Y.1    Yoon, H.2    Lee, H.H.3
  • 36
    • 23444436105 scopus 로고    scopus 로고
    • Fabrication of a 50 nm half-pitch wire grid polarizer using nanoimprint lithography
    • 1874 1-1874: 9
    • Ahn, S.W.; Lee, K.D.; Kim, J.S.; Kim, S.H.; Park, J.D.; Lee, S.H.; Yoon, P.W. Fabrication of a 50 nm half-pitch wire grid polarizer using nanoimprint lithography. Nanotechnology 2005, 16, 1874:1-1874:9.
    • (2005) Nanotechnology , vol.16
    • Ahn, S.W.1    Lee, K.D.2    Kim, J.S.3    Kim, S.H.4    Park, J.D.5    Lee, S.H.6    Yoon, P.W.7
  • 37
    • 0031223615 scopus 로고    scopus 로고
    • Nanoscale silicon field effect transistors fabricated using imprint lithography
    • Guo, L.; Krauss, P.R.; Chon, S.J. Nanoscale silicon field effect transistors fabricated using imprint lithography. Appl. Phys. Lett. 1997, 71, 1881-1883.
    • (1997) Appl. Phys. Lett. , vol.71 , pp. 1881-1883
    • Guo, L.1    Krauss, P.R.2    Chon, S.J.3
  • 38
    • 21144432461 scopus 로고    scopus 로고
    • 6 nm half-pitch lines and 0 04 μm2 static random access memory patterns by nanoimprint lithography
    • 1058 1-1058: 8
    • Austin, M.D.; Zhang, W.; Ge, H.; Wassermann, D.; Lyon, S.A.; Chou, S.Y. 6 nm half-pitch lines and 0.04 μm2 static random access memory patterns by nanoimprint lithography. Nanotechnology 2005, 16, 1058:1-1058:8.
    • (2005) Nanotechnology , vol.16
    • Austin, M.D.1    Zhang, W.2    Ge, H.3    Wassermann, D.4    Lyon, S.A.5    Chou, S.Y.6
  • 39
    • 33745645891 scopus 로고    scopus 로고
    • Trends in imprint lithography for biological applications
    • Truskett, V.N.; Watts, M.P.G. Trends in imprint lithography for biological applications. Trends Biotechnol. 2006, 24, 312-317.
    • (2006) Trends Biotechnol , vol.24 , pp. 312-317
    • Truskett, V.N.1    Watts, M.P.G.2
  • 42
    • 23744501373 scopus 로고    scopus 로고
    • High performance plasmonic crystal sensor formed by soft nanoimprint lithography
    • Malyarchuk, V.; Hua, F.; Merck, N.; Velasquez, V.; White, J.; Nuzzo, R.; Rogers, J. High performance plasmonic crystal sensor formed by soft nanoimprint lithography. Opt. Express 2005, 13, 5669-5675.
    • (2005) Opt. Express , vol.13 , pp. 5669-5675
    • Malyarchuk, V.1    Hua, F.2    Merck, N.3    Velasquez, V.4    White, J.5    Nuzzo, R.6    Rogers, J.7
  • 43
    • 33750008657 scopus 로고    scopus 로고
    • Organic light emitting devices with enhanced outcoupling via microlenses fabricated by imprint lithography
    • 073106 1-073106: 6
    • Sun, Y.; Forrest, S.R. Organic light emitting devices with enhanced outcoupling via microlenses fabricated by imprint lithography. J. Appl. Phys. 2006, 100, 073106:1-073106:6.
    • (2006) J. Appl. Phys. , vol.100
    • Sun, Y.1    Forrest, S.R.2
  • 44
    • 33748937719 scopus 로고    scopus 로고
    • Light extraction enhancement from nano-imprinted photonic crystal GaN-based blue light emitting diodes
    • Cho, H.K.; Jang, J.; Choi, J.H.; Choi, J.; Kim, J.; Lee, J.S.; Lee, B.; Choe, Y.H.; Lee, K.D.; Kim, S.H.; et al. Light extraction enhancement from nano-imprinted photonic crystal GaN-based blue light emitting diodes. Opt. Express 2006, 14, 8654-8660.
    • (2006) Opt. Express , vol.14 , pp. 8654-8660
    • Cho, H.K.1    Jang, J.2    Choi, J.H.3    Choi, J.4    Kim, J.5    Lee, J.S.6    Lee, B.7    Choe, Y.H.8    Lee, K.D.9    Kim, S.H.10
  • 45
    • 80054010598 scopus 로고    scopus 로고
    • Optimized spacial correlations for broadband light trapping nanopatterns in high efficiency ultrathin film a-Si: H solar cells
    • Ferry, V.E.; Verschuuren, M.A.; van Lare, M.C.; Schropp, R.J.; Atwater, H.A.; Polman, A. Optimized spacial correlations for broadband light trapping nanopatterns in high efficiency ultrathin film a-Si: H solar cells. Nano lett. 2011, 11, 4239-4245.
    • (2011) Nano lett , vol.11 , pp. 4239-4245
    • Ferry, V.E.1    Verschuuren, M.A.2    van Lare, M.C.3    Schropp, R.J.4    Atwater, H.A.5    Polman, A.6
  • 47
    • 79952147364 scopus 로고    scopus 로고
    • UV nano-imprint lithography technique for the replication of back reflectors for n-i-p thin film silicon solar cells
    • Söderström, K.; Escarré, J.; Cubero, O.; Hang, F.J.; Perregaux, S.; Ballif, C. UV nano-imprint lithography technique for the replication of back reflectors for n-i-p thin film silicon solar cells. Prog. Photovolt. Res. Appl. 2011, 19, 202-210.
    • (2011) Prog. Photovolt. Res. Appl. , vol.19 , pp. 202-210
    • Söderström, K.1    Escarré, J.2    Cubero, O.3    Hang, F.J.4    Perregaux, S.5    Ballif, C.6
  • 50
    • 60349122065 scopus 로고    scopus 로고
    • Anti-reflection structures on lenses by nano-imprinting using ordered porous alumina
    • 022001 1-022001: 3
    • Yanagishita, T.; Nishio, K.; Masuda, H. Anti-reflection structures on lenses by nano-imprinting using ordered porous alumina. Appl. Phys. Express 2009, 2, 022001:1-022001:3.
    • (2009) Appl. Phys. Express , vol.2
    • Yanagishita, T.1    Nishio, K.2    Masuda, H.3
  • 51
    • 67349246269 scopus 로고    scopus 로고
    • Hybrid-polymer nanostructures forming an anti-reflection film using two-beam interference and ultraviolet nanoimprint lithography
    • Chang, T.L.; Cheng, K.Y.; Chou, T.H.; Su, C.C.; Yang, H.P.; Luo, S.W. Hybrid-polymer nanostructures forming an anti-reflection film using two-beam interference and ultraviolet nanoimprint lithography. Microelectron. Eng. 2009, 86, 874-877.
    • (2009) Microelectron. Eng. , vol.86 , pp. 874-877
    • Chang, T.L.1    Cheng, K.Y.2    Chou, T.H.3    Su, C.C.4    Yang, H.P.5    Luo, S.W.6
  • 54
    • 69549096196 scopus 로고    scopus 로고
    • Roll in and roll out: a path to high-throughput nanoimprint lithography
    • Stuart, C.; Chen, Y. Roll in and roll out: a path to high-throughput nanoimprint lithography. ACS Nano 2009, 3, 2062-2069.
    • (2009) ACS Nano , vol.3 , pp. 2062-2069
    • Stuart, C.1    Chen, Y.2
  • 55
    • 42949169953 scopus 로고    scopus 로고
    • Prototype development of a roller imprint system and its application to large area polymer replication for a microstructured optical device
    • Youn, S.W.; Ogiwara, M.; Goto, H.; Takahashi, M.; Maeda, R. Prototype development of a roller imprint system and its application to large area polymer replication for a microstructured optical device. J. Mater. Process. Technol. 2008, 202, 76-85.
    • (2008) J. Mater. Process. Technol. , vol.202 , pp. 76-85
    • Youn, S.W.1    Ogiwara, M.2    Goto, H.3    Takahashi, M.4    Maeda, R.5
  • 56
    • 33847620278 scopus 로고    scopus 로고
    • Simple fabrication of nanostructure by continuous rigiflex imprinting
    • Seo, S.M.; Kim, T.I.; Lee, H.H. Simple fabrication of nanostructure by continuous rigiflex imprinting. Microelectron. Eng. 2007, 84, 567-572.
    • (2007) Microelectron. Eng. , vol.84 , pp. 567-572
    • Seo, S.M.1    Kim, T.I.2    Lee, H.H.3
  • 57
    • 70149108495 scopus 로고    scopus 로고
    • Fabrication of transparent conductive tracks and patterns on flexible substrate using a continuous UV roll imprint lithography
    • 115503 1-115503: 11
    • Han, J.; Choi, S.; Lee, B.S.; Kang, S. Fabrication of transparent conductive tracks and patterns on flexible substrate using a continuous UV roll imprint lithography. J. Phys. D Appl. Phys. 2009, 42, 115503:1-115503:11.
    • (2009) J. Phys. D Appl. Phys. , vol.42
    • Han, J.1    Choi, S.2    Lee, B.S.3    Kang, S.4
  • 59
    • 84868089446 scopus 로고    scopus 로고
    • Fabrication of transistors on flexible substrates: from mass printing to high-resolution alternative lithography strategies
    • Moonen, P.F.; Yakimets, I.; Huskens, J. Fabrication of transistors on flexible substrates: from mass printing to high-resolution alternative lithography strategies. Adv. Mater. 2012, 24, 5526-5541.
    • (2012) Adv. Mater. , vol.24 , pp. 5526-5541
    • Moonen, P.F.1    Yakimets, I.2    Huskens, J.3
  • 62
    • 0033742531 scopus 로고    scopus 로고
    • Siloxane polymers for high-resolution, high-accuracy soft lithography
    • Schmid, H.; Michel, B. Siloxane polymers for high-resolution, high-accuracy soft lithography. Macromolecules 2000, 33, 3042-3049.
    • (2000) Macromolecules , vol.33 , pp. 3042-3049
    • Schmid, H.1    Michel, B.2


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