Roll-to-roll UV imprint lithography for flexible electronics

Microelectronic Engineering

Volumn 88, Issue 8, 2011, Pages 2052-2055

  Maury, P ^a   Turkenburg, D ^b   Stroeks, N ^b   Giesen, P ^b   Barbu, I ^b   Meinders, E ^b   Van Bremen, A ^a   Iosad, N ^a   Van Der Werf, R ^a   Onvlee, H ^a  

^a ASML   (Netherlands)

^b HOLST CENTRE   (Netherlands)

Author keywords

Flexible electronics; Imprint; Roll to roll

Indexed keywords

CONTACT PADS; DIMENSIONAL INSTABILITY; IMPRINT; MULTI-LEVEL; ON-WAFER; REPRODUCIBILITIES; ROLL TO ROLL; SELF-ALIGN; SINGLE LEVEL; SOLVENT FREE; THICK RESIST; UV ILLUMINATIONS; UV IMPRINT;

DROPS; FLEXIBLE ELECTRONICS; NOZZLES; PHOTOLITHOGRAPHY; SEMICONDUCTING SILICON COMPOUNDS; SILICON WAFERS;

NANOIMPRINT LITHOGRAPHY;

EID: 79960059127     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2011.02.022     Document Type: Conference Paper

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