Superhydrophobic surfaces fabricated by nanoimprint lithography

Microelectronic Engineering

Volumn 83, Issue 4-9 SPEC. ISS., 2006, Pages 884-888

  Pozzato, Alessandro ^a   Zilio, Simone Dal ^a   Fois, Giovanni ^a   Vendramin, Diego ^a   Mistura, Giampaolo ^a   Belotti, Michele ^b   Chen, Yong ^b,c   Natali, Marco ^d  

^a UNIVERSITY OF PADOVA   (Italy)

^b CNRS   (France)

^c ECOLE NORMALE SUPÉRIEURE   (France)

^d CNR   (Italy)

Author keywords

Nanoimprint lithography; Superhydrophobic surfaces; Wet etching

Indexed keywords

ETCHING; HYDROFLUORIC ACID; LITHOGRAPHY; PHOTORESISTS; SELF ASSEMBLY; SILICON;

NANOIMPRINT LITHOGRAPHY; SUPERHYDROPHOBIC SURFACES; WET-ETCHING;

HYDROPHOBICITY;

EID: 33646068393     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2006.01.012     Document Type: Article

References (5)

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3. de Gennes P.G., BrochartWyart F., and Quéré D. Capillarity and Wetting Phenomena (2004), Springer, New York Ch 9
4. Öner D., and McCarthy T.J. Langmuir 16 (2000) 7777
5. Assuming sidewalls are segments of a circle and bottom is flat.