SCOPUS 정보 검색 플랫폼

Volumn 86, Issue 4-6, 2009, Pages 874-877

Hybrid-polymer nanostructures forming an anti-reflection film using two-beam interference and ultraviolet nanoimprint lithography

(6) Chang, Tien Li a Cheng, Kuei Yuan a Chou, Ta Hsin a Su, Chih Chieh a Yang, Han Ping a Luo, Shao Wei a,b

a INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (Taiwan)

b NATIONAL TSING HUA UNIVERSITY (Taiwan)

Author keywords

Anti adhesive layer; Atmospheric pressure plasma treatment; Hybrid polymers; Nanoimprint; Nanostructures; Two beam interference

Indexed keywords

ANTI-ADHESIVE LAYER; ATMOSPHERIC-PRESSURE PLASMA TREATMENT; HYBRID POLYMERS; NANOIMPRINT; TWO-BEAM INTERFERENCE;

ARGON; ATMOSPHERIC CHEMISTRY; CHEMICAL MODIFICATION; MOLDS; NANOSTRUCTURES; NICKEL; ORGANIC POLYMERS; PLASMA APPLICATIONS; PLASMAS; POLYETHYLENE TEREPHTHALATES; POLYMERS; SILANES; THERMOPLASTICS; TWO DIMENSIONAL;

NANOIMPRINT LITHOGRAPHY;

EID: 67349246269 PISSN: 01679317 EISSN: None Source Type: Journal
DOI: 10.1016/j.mee.2009.01.038 Document Type: Article

Times cited : (30)

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