Formation of methyl radicals from decomposition of methyl-substituted silanes over tungsten and tantalum filament surfaces

Journal of Physical Chemistry A

Volumn 117, Issue 33, 2013, Pages 7697-7704

  Toukabri, R ^a   Alkadhi, N ^a   Shi, Y J ^a  

^a UNIVERSITY OF CALGARY   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

APPARENT ACTIVATION ENERGY; DISSOCIATION PROCESS; HIGH TEMPERATURE; LOW TEMPERATURES; LOW-ACTIVATION ENERGY; OPTIMUM TEMPERATURE; TETRAMETHYLSILANE; VACUUM ULTRAVIOLET LASER IONIZATIONS;

ACTIVATION ENERGY; DISSOCIATION; MASS SPECTROMETRY; MOLECULES; SILANES; SILICON; TUNGSTEN; ULTRAVIOLET LASERS;

TANTALUM;

EID: 84883143567     PISSN: 10895639     EISSN: 15205215     Source Type: Journal    
DOI: 10.1021/jp404882t     Document Type: Article

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