The influence of filament material on radical production in hot wire chemical vapor deposition of a-Si:H

Thin Solid Films

Volumn 485, Issue 1-2, 2005, Pages 126-134

  Duan, H L ^a   Bent, Stacey F ^b  

^a STANFORD UNIVERSITY   (United States)

^b Stanford University   (United States)

Author keywords

Filament material; Hot wire chemical vapor deposition; Molybdenum; Rhenium; Tantalum; Tungsten

Indexed keywords

ACTIVATION ENERGY; CHEMICAL ACTIVATION; CHEMICAL VAPOR DEPOSITION; DECOMPOSITION; DESORPTION; FILM GROWTH; MOLYBDENUM; RUTHENIUM; SILANES; TANTALUM; TUNGSTEN;

DESORPTION ENERGY; FILAMENT MATERIALS; HOT WIRE CHEMICAL VAPOR DEPOSITION; MICROCRYSTALLINE SILICON FILMS;

PLASTIC FILAMENTS;

EID: 21344460478     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.03.038     Document Type: Article

References (37)

1. A.H. Mahan Sol. Energy Mater. Sol. Cells 78 2003 299
2. R.A. Street Technology and Applications of Amorphous Silicon 2000 Springer Verlag 422
3. R.E.I. Schropp, and M. Zeman Amorphous and Microcrystalline Silicon Solar Cells Modeling, Materials and Device Technology 1998 Kluwer Academic Publishers 207
4. A.H. Mahan, A. Mason, B.P. Nelson, and A.C. Gallagher Mater. Res. Soc. Symp. Proc. 609 2000 A.6.6.1
5. P.A.T.T. van Veenendaal, O.L.J. Gijzeman, J.K. Rath, and R.E.I. Schropp Thin Solid Films 395 2001 194
6. M. Fonrodona, D. Soler, J.M. Asensi, J. Bertomeu, and J. Andreu J. Non-Cryst. Solids 299 2002 14
7. S. Morrison, and A. Madan J. Vac. Sci. Technol., A Vac. Surf Films 19 2001 2817
8. M.B. Schubert, K. Bruhne, C. Kohler, and J.H. Werner Thin Solid Films 395 2001 163
9. H. Matsumura Jpn. J. Appl. Phys. 37 1998 3176
10. K.M. McNamara, and K.K. Gleason J. Electrochem. Soc. 140 1993 L22
11. H.L. Duan, G.A. Zaharias, and S.F. Bent Mater. Res. Soc. Symp. Proc. 715 2002 A15.5.10
12. H.L. Duan, G.A. Zaharias, and S.F. Bent Appl. Phys. Lett. 78 2001 1784
13. H.L. Duan, and S.F. Bent Mater. Res. Soc. Symp. Proc. 569 1999 179
14. H.L. Duan, G.A. Zaharias, and S.F. Bent Curr. Opin. Solid State Mater. Sci. 6 2002 471
15. P.A. Redhead Vacuum 12 1962 203
16. H. Rauscher Surf. Sci. Rep. 42 2001 207
17. S. Tange, K. Inoue, K. Tonokura, and M. Koshi Thin Solid Films 395 2001 42
18. H. Matsumura, A. Masuda, and A. Izumi Mater. Res. Soc. Symp. Proc. 557 1999 67
19. R. Zedlitz, F. Kessler, and M. Heintze J. Non-Cryst. Solids 164-166 1993 83
20. R. Walsh Acc. Chem. Res. 14 1981 246
21. J. Doyle, R. Robertson, G.H. Lin, M.Z. He, and A. Gallagher J. Appl. Phys. 64 1988 3215
22. K. Tonokura, K. Inoue, and M. Koshi J. Non-Cryst. Solids 299 2002 25
23. J.K. Holt, M. Swiatek, D.G. Goodwin, and H.A. Atwater Mater. Res. Soc. Symp. Proc. 715 2002 A23.3
24. V.N. Ageev, E.Y. Afanaseva, N.D. Potekhina, and A.Y. Potekhin Phys. Solid State 42 2000 356
25. V.N. Ageev, and E.Y. Afanaseva Phys. Solid State 39 1997 1318
26. O.F. Swenson, and M.K. Sinha J. Vac. Sci. Technol. 9 1971 942
27. M. Hashimoto, T. Matsushima, K. Azuma, and T. Matsui Surf. Sci. 137 1984 L75
28. N.R. Gall, E.V. Rut'kov, and A.Y. Tontegode Sov. Phys. Tech. Phys. 35 1990 475
29. J. Olmested III, and G.M. Williams Chemistry 1997 Wm. C. Brown Publishers 1056
30. S.L. Kharatyan, A.A. Chatilyan, G.A. Voskerchan, and Z.A. Manasaryan Chem. Phys. Rep. 16 1997 1217
31. R.C. Baetzold, and G.A. Somorjai J. Catal. 45 1976 94
32. A.G. Sault, and D.W. Goodman Surf. Sci. 235 1990 28
33. J.F. Weaver, A.F. Carlsson, and R.J. Madix Surf. Sci. Rep. 50 2003 107
34. T.W. Hickmott J. Chem. Phys. 32 1960 810
35. S.M. Gates Chem. Rev. 96 1996 1519
36. R.I. Masel Principles of Adsorption and Reaction on Solid State Surfaces 1996 John Wiley and Sons New York 824
37. G.T. Barkema, and N. Mousseau Phys. Rev. Lett. 81 1998 1865