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Surface Science

Volumn 375, Issue 1, 1997, Pages 35-44

Surface chemistry of alkylsilanes on Si(1000)2 × 1

(4) Foster, Michelle a Darlington, Bill a,b Scharff, Jason a,c Campion, Alan a

a UNIVERSITY OF TEXAS AT AUSTIN (United States)

b MOTOROLA INC (United States)

c UNIVERSITY OF PITTSBURGH (United States)

Author keywords

Alkylsilanes; Chemical vapor deposition; Electron energy loss spectroscopy; Silicon; Single crystal epitaxy; Surface chemical reaction; Thermal desorption spectroscopy; Vibrations of adsorbed molecules

Indexed keywords

ADSORPTION; CHEMICAL VAPOR DEPOSITION; ELECTRON ENERGY LOSS SPECTROSCOPY; EPITAXIAL GROWTH; MASS SPECTROMETRY; MOLECULAR VIBRATIONS; PYROLYSIS; SEMICONDUCTING SILICON; SILANES; SURFACE PROPERTIES; SURFACE TREATMENT; TEMPERATURE PROGRAMMED DESORPTION;

ALKYLSILANES; SINGLE CRYSTAL EPITAXY; THERMAL DESORPTION SPECTROSCOPY;

SURFACES;

EID: 0031101318 PISSN: 00396028 EISSN: None Source Type: Journal
DOI: 10.1016/S0039-6028(96)01260-5 Document Type: Article

Times cited : (27)

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