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Volumn 263, Issue 2-3, 2007, Pages 233-242
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Mass spectrometric study of gas-phase chemistry in a hot-wire chemical vapor deposition reactor with tetramethylsilane
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Author keywords
Hot wire chemical vapor deposition; Silene; Tetramethylsilane; Vacuum ultraviolet laser ionization mass spectrometry
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Indexed keywords
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EID: 34247334202
PISSN: 13873806
EISSN: None
Source Type: Journal
DOI: 10.1016/j.ijms.2007.02.051 Document Type: Article |
Times cited : (33)
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References (36)
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