The influence of the filament temperature on the structure of hot-wire deposited silicon

Thin Solid Films

Volumn 430, Issue 1-2, 2003, Pages 46-49

  Van der Werf, C H M ^a   Van Veenendaal, P A T T ^a   Van Veen, M K ^a   Hardeman, A J ^a   Rusche, M Y S ^a   Rath, J K ^a   Schropp, R E I ^a  

^a UTRECHT UNIVERSITY   (Netherlands)

Author keywords

Crystalline orientation; Filament temperature; Hot wire chemical vapour deposition; Hydrogen dissociation

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CRYSTAL ORIENTATION; DISSOCIATION; HYDROGEN; MOLECULAR STRUCTURE; RAMAN SPECTROSCOPY; SHIELDING; SOLAR CELLS; THERMAL EFFECTS; X RAY DIFFRACTION ANALYSIS;

SILICON DEPOSITION;

POLYSILICON;

EID: 0037513322     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(03)00136-6     Document Type: Conference Paper

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