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Volumn 45, Issue 2, 2010, Pages 215-222

Decomposition of 1,1-dimethyl-1-silacyclobutane on a tungsten filament - Evidence of both ring C-C and ring Si-C bond cleavages

Author keywords

1,1 dimethyl 1 silacyclobutane; Chemical vapor deposition; Reaction mechanisms; Tungsten; Vacuum ultraviolet laser ionization mass spectrometry

Indexed keywords

1,1-DIMETHYL-1-SILACYCLOBUTANE; BOND CLEAVAGES; C-C BONDS; CATALYTIC PROCESS; COLLISION-FREE CONDITIONS; DIMETHYLSILYLENE; DIRADICAL INTERMEDIATES; DIRADICALS; GASPHASE; METHYL RADICAL; REACTION MECHANISMS; SECONDARY REACTIONS; SI-C BOND; SILACYCLOBUTANE; SINGLE PHOTON IONIZATION; TETRAMETHYL; TIME OF FLIGHT MASS SPECTROMETRY; TUNGSTEN FILAMENTS; VACUUM ULTRAVIOLET LASER IONIZATIONS; VACUUM ULTRAVIOLETS; W FILAMENT;

EID: 76249133046     PISSN: 10765174     EISSN: 10969888     Source Type: Journal    
DOI: 10.1002/jms.1712     Document Type: Article
Times cited : (28)

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