On the mechanism of H atom production in hot filament activated H 2 and CH4 / H2 gas mixtures

Journal of Chemical Physics

Volumn 131, Issue 4, 2009, Pages

  Comerford, Dane W ^a   Smith, James A ^a   Ashfold, Michael N R ^a   Mankelevich, Yuri A ^b  

^a UNIVERSITY OF BRISTOL   (United Kingdom)

^b MOSCOW STATE UNIVERSITY   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

ATOM FORMATION; DESORPTION PROCESS; DIAMOND GROWTH; DISSOCIATIVE ADSORPTION; FILAMENT TEMPERATURE; GAS PRESSURES; H-ATOM DENSITY; HOT FILAMENT; IN-SITU MEASUREMENT; POWER CONSUMPTION; TWO-STEP MECHANISMS;

ADSORPTION; ATOMS; CHEMISORPTION; DESORPTION; DISSOCIATION; ELECTRIC POWER UTILIZATION; FILAMENTS (LAMP); HELIUM; TANTALUM;

GAS MIXTURES;

EID: 68249109825     PISSN: 00219606     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3180816     Document Type: Article

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