Competition of silene/silylene chemistry with free radical chain reactions using 1-methylsilacyclobutane in the hot-wire chemical vapor deposition process

Journal of Physical Chemistry A

Volumn 116, Issue 41, 2012, Pages 10054-10062

  Badran, I ^a   Forster, T D ^a   Roesler, R ^a   Shi, Y J ^a  

^a UNIVERSITY OF CALGARY   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

FILAMENT TEMPERATURE; FREE RADICAL CHAIN REACTION; GAS-PHASE REACTIONS; HOT WIRE CHEMICAL VAPOR DEPOSITION; HOT WIRE CVD; METHYL RADICAL; PRIMARY DECOMPOSITION; REACTIVE SPECIES; SHORT REACTION TIME; SILYLENE SPECIES; TUNGSTEN FILAMENTS;

ACTIVATION ENERGY; CYCLOADDITION; DECOMPOSITION; FREE RADICALS; ISOMERIZATION; PHASE INTERFACES; PROPYLENE; TUNGSTEN; VAPORS; WIRE;

CHEMICAL VAPOR DEPOSITION;

1 METHYLSILACYCLOBUTANE; 1-METHYLSILACYCLOBUTANE; CYCLOBUTANE DERIVATIVE; FREE RADICAL; SILANE DERIVATIVE;

ARTICLE; CHEMICAL STRUCTURE; CHEMISTRY; SILENE; TEMPERATURE; VOLATILIZATION;

CYCLOBUTANES; FREE RADICALS; MOLECULAR STRUCTURE; SILANES; SILENE; TEMPERATURE; VOLATILIZATION;

EID: 84867637998     PISSN: 10895639     EISSN: 15205215     Source Type: Journal    
DOI: 10.1021/jp3055558     Document Type: Article

References (49)

1. Guselnikov, L. E. Coord. Chem. Rev. 2003, 244, 149-240
2. Johnson, A. D.; Perrin, J.; Mucha, J. A.; Ibbotson, D. E. J. Phys. Chem. 1993, 97, 12937-12948
3. Larkin, D. J.; Interrante, L. V. Chem. Mater. 1992, 4, 22-24
4. Steckl, A. J.; Yuan, C.; Li, J. P.; Loboda, M. J. Appl. Phys. Lett. 1993, 63, 3347-3349
5. Yuan, C.; Steckl, A. J.; Loboda, M. J. Appl. Phys. Lett. 1994, 64, 3000-3002
6. Wrobel, A. M.; Stanczyk, W. Chem. Mater. 1994, 6, 1766-1770
7. Loboda, M. J.; Seifferly, J. A.; Dall, F. C. J. Vac. Sci. Technol., A 1994, 12, 90-96
8. Pola, J.; Bastl, Z.; Subrt, J.; Taylor, R. J. Mater. Chem. 1995, 5, 1345-1349
9. Mahan, A. H.; Carapella, J.; Nelson, B. P.; Crandall, R. S.; Balberg, I. J. Appl. Phys. 1991, 69, 6728-6730
10. Matsumura, H. Appl. Phys. Lett. 1987, 51, 804-805
11. Shi, Y. J.; Tong, L.; Eustergerling, B. D.; Li, X. M. Thin Solid Films 2011, 519, 4442-4446
12. Zaharias, G. A.; Duan, H. L.; Bent, S. F. J. Vac. Sci. Technol., A 2006, 24, 542-549
13. Li, X. M.; Eustergerling, B. D.; Shi, Y. J. Int. J. Mass Spectrom. 2007, 263, 233-242
14. Shi, Y. J.; Li, X. M.; Tong, L.; Toukabri, R.; Eustergerling, B. D. Phys. Chem. Chem. Phys. 2008, 10, 2543-2551
15. Shi, Y. J.; Li, X. M.; Toukabri, R.; Tong, L. J. Phys. Chem. A 2011, 115, 10290-10298
16. Shi, Y. J.; Lo, B.; Tong, L.; Li, X. M.; Eustergerling, B. D.; Sorensen, T. S. J. Mass Spectrom. 2007, 42, 575-583
17. Tong, L.; Shi, Y. J. Thin Solid Films 2009, 517, 3461-3465
18. Tong, L.; Shi, Y. J. J. Mass Spectrom. 2010, 45, 215-222
19. Tong, L.; Shi, Y. J. Can. J. Chem. 2011, 89, 19-26
20. Conlin, R. T.; Wood, D. L. J. Am. Chem. Soc. 1981, 103, 1843-1844
21. Conlin, R. T.; Kwak, Y. W. Organometallics 1984, 3, 918-922
22. Conlin, R. T.; Kwak, Y. W. J. Am. Chem. Soc. 1986, 108, 834-835
23. Davidson, I. M. T.; Fenton, A.; Ijadimaghsoodi, S.; Scampton, R. J.; Auner, N.; Grobe, J.; Tillman, N.; Barton, T. J. Organometallics 1984, 3, 1593-1595
24. Barton, T. J.; Tillman, N. J. Am. Chem. Soc. 1987, 109, 6711-6716
25. Auner, N.; Grobe, J.; Muller, T.; Rahmann, H. W. Organometallics 2000, 19, 3476-3485
26. Pola, J.; Chvalovsky, V.; Volnina, E. A.; Guselnikov, L. E. J. Organomet. Chem. 1988, 341, C13-C16
27. Vatsa, R. K.; Kumar, A.; Naik, P. D.; Upadhyaya, H. P.; Pavanaja, U. B.; Saini, R. D.; Mittal, J. P.; Pola, J. Chem. Phys. Lett. 1996, 255, 129-133
28. Leigh, W. J.; Boukherroub, R.; Kerst, C. J. Am. Chem. Soc. 1998, 120, 9504-9512
29. Schuhle, U.; Pallix, J. B.; Becker, C. H. J. Am. Chem. Soc. 1988, 110, 2323-2324
30. Shi, Y. J.; Hu, X. K.; Mao, D. M.; Dimov, S. S.; Lipson, R. H. Anal. Chem. 1998, 70, 4534-4539
31. Shi, Y. J.; Consta, S.; Das, A. K.; Mallik, B.; Lacey, D.; Lipson, R. H. J. Chem. Phys. 2002, 116, 6990-6999
32. Chambreau, S. A.; Lemieux, J.; Wang, L. M.; Zhang, J. S. J. Phys. Chem. A 2005, 109, 2190-2196
33. Shukla, B.; Susa, A.; Miyoshi, A.; Koshi, M. J. Phys. Chem. A 2007, 111, 8308-8324
34. Duan, H. L.; Zaharias, G. A.; Bent, S. F. Appl. Phys. Lett. 2001, 78, 1784-1786
35. Denmark, S. E.; Griedel, B. D.; Coe, D. M.; Schnute, M. E. J. Am. Chem. Soc. 1994, 116, 7026-7043
36. Szepes, L.; Baer, T. J. Am. Chem. Soc. 1984, 106, 273-278
37. Davalos, J. Z.; Baer, T. J. Phys. Chem. A 2006, 110, 8572-8579
38. Walsh, R. Acc. Chem. Res. 1981, 14, 246-252
39. Holt, J. K.; Swiatek, M.; Goodwin, D. G.; Atwater, H. A. J. Appl. Phys. 2002, 92, 4803-4808
40. Duan, H. L.; Bent, S. F. Thin Solid Films 2005, 485, 126-134
41. Williams, B. A.; Cool, T. A. J. Chem. Phys. 1991, 94, 6358-6366
42. Wood, K. V.; Taylor, J. W. Int. J. Mass Spectrom. Ion Processes 1979, 30, 307-318
43. Voronkov, M. G.; Klyuchnikov, V. A.; Sokolova, E. V.; Danilova, T. F.; Shvets, G. N.; Korchagina, A. N.; Gusselnikov, L. E.; Volkova, V. V. J. Organomet. Chem. 1991, 401, 245-248
44. Davidson, I. M. T.; Hughes, K. J.; Scampton, R. J. J. Organomet. Chem. 1984, 272, 11-18
45. Goddard, J. D.; Yoshioka, Y.; Schaefer, H. F. J. Am. Chem. Soc. 1980, 102, 7644-7650
46. Shin, S. K.; Irikura, K. K.; Beauchamp, J. L.; Goddard, W. A. J. Am. Chem. Soc. 1988, 110, 24-30
47. Berkowitz, J.; Greene, J. P.; Cho, H.; Ruscic, B. J. Chem. Phys. 1987, 86, 674-676
48. Luo, Y. R.; Pacey, P. D. Int. J. Mass Spectrom. Ion Processes 1992, 112, 63-77
49. Tong, L.; Shi, Y. J. ACS Appl. Mater. Interfaces 2009, 1, 1919-1926