Detecting free radicals during the hot wire chemical vapor deposition of amorphous silicon carbide films using single-source precursors

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 24, Issue 3, 2006, Pages 542-549

  Zaharias, Gillian A ^a   Duan, H L ^a   Bent, Stacey F ^a  

^a Stanford University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

MONOMETHYLSILANE; ORGANOSILICON PRECURSORS; PHOTON IONIZATION; SILICON CARBIDE FILMS;

AMORPHOUS MATERIALS; CHEMICAL VAPOR DEPOSITION; IONIZATION; PHOTONS; SILICON CARBIDE; VACUUM;

THIN FILMS;

EID: 33646676062     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2194023     Document Type: Article

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