Electrical properties of platinum interconnects deposited by electron beam induced deposition of the carbon-free precursor, Pt(PF3)4

Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics

Volumn 31, Issue 2, 2013, Pages

  Oregan, Colm ^a   Lee, Angelica ^a   Holmes, Justin D ^a   Petkov, Nikolay ^a   Trompenaars, Piet ^b   Mulders, Hans ^b  

^a UNIVERSITY COLLEGE CORK   (Ireland)

^b Thermo Fisher Scientific   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CARBON; DEPOSITS; ELECTRIC PROPERTIES; ELECTRON BEAMS; ORGANOMETALLICS; SINTERING;

COMPREHENSIVE ANALYSIS; ELECTRICAL PERFORMANCE; ELECTRON BEAM-INDUCED DEPOSITION; HEATING EXPERIMENT; MAXIMUM CURRENT DENSITY; ORGANOMETALLIC PRECURSORS; POST DEPOSITION ANNEALING; REDUCING CONDITIONS;

PLATINUM;

EID: 84875795966     PISSN: 21662746     EISSN: 21662754     Source Type: Journal    
DOI: 10.1116/1.4794343     Document Type: Article

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