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Volumn 107, Issue 2-3, 2007, Pages 131-139

In situ site-specific specimen preparation for atom probe tomography

Author keywords

Atom probe tomography

Indexed keywords

ION BEAMS; ION IMPLANTATION; NANOSTRUCTURED MATERIALS; SILICON WAFERS;

EID: 33845659565     PISSN: 03043991     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.ultramic.2006.06.008     Document Type: Article
Times cited : (1528)

References (26)
  • 7
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    • K. Thompson, D.J. Larson, R.M. Ulfig, J.H. Bunton, T.F. Kelly, Solid State Technology (2006).
  • 8
    • 33845663800 scopus 로고    scopus 로고
    • T.T. Tsong, Atom-Probe Field Ion Microscopy: Field Ion Emission, and Surfaces and Interfaces at Atomic Resolution, Cambridge University Press, Cambridge, 1990.
  • 13
    • 33845604212 scopus 로고    scopus 로고
    • T.F. Kelly, R.L. Martens, S.L. Goodman, Methods of sampling specimens for microanalysis. US Patent No. 6,576,900, 2003.
  • 19
    • 33845635867 scopus 로고    scopus 로고
    • http://www.feicompany.com/systems/index.aspx.
  • 20
    • 33845607417 scopus 로고    scopus 로고
    • http://www.omniprobe.com.
  • 21
    • 33845650422 scopus 로고    scopus 로고
    • http://www.imago.com/imago/html/products/leap.jsp.
  • 26
    • 33750895771 scopus 로고    scopus 로고
    • K. Thompson, B. Gorman, D. J. Larson, B. van Leer, L. Hong, Minimization of Ga induced FIB damage using low energy clean-up, in: Proceedings of Microscopy and Microanalysis, Chicago, IL, 2006.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.