Influence of inert gases on the reactive high power pulsed magnetron sputtering process of carbon-nitride thin films

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 31, Issue 1, 2013, Pages

  Schmidt, Susann ^a   Czigány, Zsolt ^b   Greczynski, Grzegorz ^a   Jensen, Jens ^a   Hultman, Lars ^a  

^a LINKÖPING UNIVERSITY   (Sweden)

^b INSTITUTE OF EXPERIMENTAL MEDICINE   (Hungary)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION CHAMBERS; ENERGETIC ION; ENERGETIC PARTICLES; FULLERENE-LIKE STRUCTURES; GRAPHITE TARGET; HIGH POWER PULSED MAGNETRON SPUTTERING; ION FLUXES; ION MASS SPECTROMETRY; ION MASS SPECTROSCOPY; REACTIVE GAS; SPUTTER PROCESS; STRUCTURAL EVOLUTION; THIN SOLID FILM; TIME-AVERAGED; TIME-RESOLVED;

AMORPHOUS CARBON; AMORPHOUS FILMS; ARGON; CARBON FILMS; DEPOSITION RATES; DEPOSITS; GASES; KRYPTON; MAGNETRON SPUTTERING; MASS SPECTROMETRY; NEON; NITROGEN; PHOTOELECTRONS; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; VAPOR DEPOSITION; X RAY PHOTOELECTRON SPECTROSCOPY;

CARBON NITRIDE;

EID: 84871868394     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.4769725     Document Type: Article

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