Ion mass spectrometry investigations of the discharge during reactive high power pulsed and direct current magnetron sputtering of carbon in Ar and Ar/N 2

Journal of Applied Physics

Volumn 112, Issue 1, 2012, Pages

  Schmidt, S ^a   Czigány, Zs ^b   Greczynski, G ^a   Jensen, J ^a   Hultman, L ^a  

^a LINKÖPING UNIVERSITY   (Sweden)

^b INSTITUTE OF EXPERIMENTAL MEDICINE   (Hungary)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION PRESSURES; DIRECT CURRENT MAGNETRON SPUTTERING; GRAPHITE TARGET; HIGH POWER IMPULSE MAGNETRON SPUTTERING (HIPIMS); HIGH-POWER; ION ENERGIES; ION ENERGY DISTRIBUTION FUNCTIONS; ION MASS SPECTROMETRY; MOLECULAR IONS; PLASMA SPECIES; PULSE ENERGIES; PULSE FREQUENCIES; PULSEWIDTHS; SPUTTER GAS; TIME EVOLUTIONS; TIME-AVERAGED; TIME-RESOLVED; WORKING GAS;

IONS; MAGNETRON SPUTTERING; MASS SPECTROMETRY; TRANSMISSION ELECTRON MICROSCOPY;

ARGON;

EID: 84864148713     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.4733692     Document Type: Article

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