Exploring the potential of high power impulse magnetron sputtering for growth of diamond-like carbon films

Surface and Coatings Technology

Volumn 206, Issue 10, 2012, Pages 2706-2710

  Sarakinos, K ^a,c   Braun, A ^a   Zilkens, C ^a   Mraz S ^a   Schneider, J M ^a   Zoubos, H ^b   Patsalas, P ^b  

^a RWTH AACHEN UNIVERSITY   (Germany)

^b UNIVERSITY OF IOANNINA   (Greece)

^c LINKÖPING UNIVERSITY   (Sweden)

Author keywords

Diamond like carbon; HiPIMS; HPPMS; Ionized PVD

Indexed keywords

AVERAGE ENERGY; DEPOSITION CONDITIONS; DIAMOND-LIKE CARBON; DIRECT CURRENT MAGNETRON SPUTTERING; FILM PROPERTIES; HIGH-POWER; HIPIMS; HPPMS; IONIZED PVD; IONIZED SPECIES; MASS DENSITIES; NEGATIVE BIAS; PLASMA ANALYSIS; PLASMA COMPOSITION; POSITIVELY CHARGED IONS; PULSING FREQUENCIES;

AMORPHOUS CARBON; AMORPHOUS FILMS; DIAMOND LIKE CARBON FILMS; ELECTRIC DISCHARGES; FILM GROWTH; IONIZATION; IONS; MAGNETRON SPUTTERING; PLASMA DEPOSITION;

CARBON FILMS;

EID: 84855295013     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2011.11.032     Document Type: Article

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