Photoelectron emission from thin overlayers

Journal of Electron Spectroscopy and Related Phenomena

Volumn 185, Issue 11, 2012, Pages 498-508

  Jablonski, A ^a  

^a INSTITUTE OF PHYSICAL CHEMISTRY   (Poland)

Author keywords

Overlayer thickness measurements; Overlayer substrate systems; Photoelectron transport theory; X ray photoelectron spectroscopy

Indexed keywords

EFFECTIVE ATTENUATION LENGTH; ELASTIC PHOTOELECTRON SCATTERING; LOW PROBABILITY; LOW SENSITIVITY; MONTE CARLO SIMULATION; OVERLAYERS; PHOTO-ELECTRON EMISSION; PHOTOELECTRON INTENSITIES; PHOTOELECTRON SIGNALS; PHOTOELECTRON TRANSPORT; SIGNAL INTENSITIES; SUBSTRATE MATERIAL; THEORETICAL MODELS; TRANSPORT APPROXIMATION; X-RAY SOURCES;

BOLTZMANN EQUATION; ENERGY DISSIPATION; MONTE CARLO METHODS; PHOTONS; STATISTICAL MECHANICS; SUBSTRATES; THICKNESS GAGES; THICKNESS MEASUREMENT; TISSUE; X RAY PHOTOELECTRON SPECTROSCOPY;

PHOTOELECTRONS;

EID: 84871833277     PISSN: 03682048     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.elspec.2012.09.014     Document Type: Article

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