Escape probability of s-photoelectrons leaving aluminium and copper oxides

Surface and Interface Analysis

Volumn 26, Issue 3, 1998, Pages 182-187

  Zemek, J ^a   Hucek, S ^a   Jablonski, A ^b   Tilinin, I S ^c  

^a INSTITUTE OF PHYSICS   (Czech Republic)

^b INSTITUTE OF PHYSICAL CHEMISTRY   (Poland)

^c UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

Depth distribution function; Escape probability of photoelectrons; Inelastic and elastic electron scattering; Overlayer experiment

Indexed keywords

ALUMINA; APPROXIMATION THEORY; BOUNDARY CONDITIONS; COMPUTER SIMULATION; COPPER OXIDES; ELECTROMAGNETIC WAVE TRANSMISSION; ELECTRON ENERGY LEVELS; FUNCTIONS; MATHEMATICAL MODELS; MONTE CARLO METHODS; PROBABILITY; X RAYS;

DEPTH DISTRIBUTION FUNCTIONS; ELASTIC ELECTRON SCATTERING; INELASTIC ELECTRON SCATTERING; OVERLAYERS; PHOTOELECTRONS;

ELECTRON SCATTERING;

EID: 0032025823     PISSN: 01422421     EISSN: None     Source Type: Journal    
DOI: 10.1002/(SICI)1096-9918(199803)26:3<182::AID-SIA358>3.0.CO;2-Z     Document Type: Article

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