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Volumn 85, Issue 3, 1997, Pages 257-262

Escape probability of O 1s photoelectrons leaving copper oxide

Author keywords

CuO; Depth distribution function; Escape probability of photoelectrons; Mean escape depth; Overlayer method

Indexed keywords


EID: 0000820496     PISSN: 03682048     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0368-2048(97)00070-4     Document Type: Article
Times cited : (24)

References (15)
  • 6
    • 85033099519 scopus 로고
    • American Society for Testing and Materials, Philadelphia, Vol. 3.06
    • 1995 Annual Book of Standards, American Society for Testing and Materials, Philadelphia, 1994, Vol. 3.06, p. 189.
    • (1994) 1995 Annual Book of Standards , pp. 189


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.