Ultrathin SiO2 on Si. VII. Angular accuracy in XPS and an accurate attenuation length

Surface and Interface Analysis

Volumn 37, Issue 9, 2005, Pages 731-736

  Seah, M P ^a   Spencer, S J ^a  

^a NATIONAL PHYSICAL LABORATORY   (United Kingdom)

Author keywords

Angle of emission; Calibration; Silicon dioxide; Thickness measurements; Traceability; XPS

Indexed keywords

ATTENUATION; CALIBRATION; LASERS; MIRRORS; SEMICONDUCTOR DEVICES; SILICON; X RAY PHOTOELECTRON SPECTROSCOPY;

ANGLE OF EMISSION; ANGLE-RESOLVED XPS; THICKNESS MEASUREMENTS; TRACEABILITY;

SILICA;

EID: 24944433004     PISSN: 01422421     EISSN: None     Source Type: Journal    
DOI: 10.1002/sia.2070     Document Type: Article

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