Direct patterning of TiO 2 using step-and-flash imprint lithography

ACS Nano

Volumn 6, Issue 2, 2012, Pages 1494-1502

  Ganesan, Ramakrishnan ^a   Dumond, Jarrett ^a   Saifullah, Mohammad S M ^a   Lim, Su Hui ^a   Hussain, Hazrat ^a,b   Low, Hong Yee ^a  

^a INSTITUTE OF MATERIALS RESEARCH AND ENGINEERING   (Singapore)

^b ABDUL WALI KHAN UNIVERSITY   (Pakistan)

Author keywords

metal oxides; nanofabrication; nanolithography; step and flash nanoimprint lithography

Indexed keywords

DIRECT-PATTERNING; DISPENSING SYSTEMS; FUNCTIONAL OXIDES; INORGANIC MATERIALS; METAL OXIDES; METAL PRECURSOR; NANO-IMPRINT; ORGANICS; PATTERN DENSITY; PATTERNED STRUCTURE; PREPOLYMERS; PROOF OF CONCEPT; RESIST FORMULATIONS; STEP AND FLASH IMPRINT LITHOGRAPHY; SUB-100 NM; TIO; TITANIUM COMPLEXES; WAFER SCALE FABRICATION; WAFER-SCALE;

ASPECT RATIO; NANOLITHOGRAPHY; NANOTECHNOLOGY; SILICON WAFERS; TITANIUM COMPOUNDS; TITANIUM DIOXIDE; ULTRAVIOLET RADIATION;

NANOIMPRINT LITHOGRAPHY;

EID: 84857750584     PISSN: 19360851     EISSN: 1936086X     Source Type: Journal    
DOI: 10.1021/nn204405k     Document Type: Article

References (44)

1. Shi, J.; Sun, C.; Starr, M. B.; Wang, X. Growth of Titanium Dioxide Nanorods in 3D-Confined Spaces Nano Lett. 2011, 11, 624-631
2. 2/Î- Glycidoxypropyltrimethoxysilane Composite Materials for Optical Waveguides Appl. Phys. A: Mater. Sci. Process. 2001, 73, 171-176 (Pubitemid 32715550)
3. Fujishima, A.; Rao, T. N.; Tryk, D. A. Titanium Dioxide Photocatalysis J. Photochem. Photobiol. C 2000, 1, 1-21
4. Smetaniuk, D. P.; Taschuk, M. T.; Brett, M. J. Photocatalytic Titanium Dioxide Nanostructures for Self-Regenerating Relative Humidity Sensors IEEE Sens. J. 2011, 11, 1713-1719
5. Tohge, N.; Shinmou, K.; Minami, T. Characteristics of Diffraction Gratings Fabricated by the Two-Beam Interference Method Using Photosensitive Hybrid Gel Films J. Sol-Gel Sci. Technol. 2000, 19, 119-123 (Pubitemid 32136128)
6. 2 Resists Nano Lett. 2003, 3, 1587-1591 (Pubitemid 37518177)
7. Duoss, E. B.; Twardowski, M.; Lewis, J. A. Sol-Gel Inks for Direct-Write Assembly of Functional Oxides Adv. Mater. 2007, 19, 3485-3489 (Pubitemid 350134586)
8. 2 Using Femtosecond Laser Pulses Adv. Mater. 2007, 19, 1218-1221 (Pubitemid 46942250)
9. 2 Patterning Using Electro-Hydrodynamic Lithography Soft Matter 2007, 3, 554-557 (Pubitemid 46718780)
10. Van Kan, J. A.; Bettiol, A. A.; Chiam, S. Y.; Saifullah, M. S. M.; Subramanian, K. R. V.; Welland, M. E.; Watt, F. New Resists for Proton Beam Writing Nucl. Instrum. Methods Phys. Res., Sect. B 2007, 260, 460-463 (Pubitemid 46874699)
11. 2 Nanostructures Nanotechnology 2010, 21, 285303
12. Park, H. H.; Choi, D. G.; Zhang, X.; Jeon, S.; Park, S. J.; Lee, S. W.; Kim, S.; Kim, K. D.; Choi, J. H.; Lee, J. et al. Photo-Induced Hybrid Nanopatterning of Titanium Dioxide via Direct Imprint Lithography J. Mater. Chem. 2010, 20, 1921-1926
13. Schrift, H. Nanoimprint Lithography: An Old Story in Modern Times? A Review J. Vac. Sci. Technol. B 2008, 26, 458-480
14. Costner, E. A.; Lin, M. W.; Jen, W.-L.; Willson, C. G. Nanoimprint Lithography Materials Development for Semiconductor Device Fabrication Annu. Rev. Mater. Res. 2009, 39, 155-180
15. Guo, L. J. Nanoimprint Lithography: Methods and Material Requirements Adv. Mater. 2007, 19, 495-513 (Pubitemid 46942304)
16. Chou, S. Y.; Krauss, P. R.; Renstrom, P. J. Nanoimprint Lithography J. Vac. Sci. Technol. B 1996, 14, 4129-4133 (Pubitemid 126582846)
17. Austin, M. D.; Ge, H.; Wu, W.; Li, M.; Yu, Z.; Wasserman, D.; Lyon, S. A.; Chou, S. Y. Fabrication of 5 nm Linewidth and 14 nm Pitch Features by Nanoimprint Lithography Appl. Phys. Lett. 2004, 84, 5299-5301
18. 2 Static Random Access Memory Patterns by Nanoimprint Lithography Nanotechnology 2005, 16, 1058-1061 (Pubitemid 40878599)
19. Hua, F.; Sun, Y.; Gaur, A.; Meiti, M. A.; Bilhaunt, L.; Rotkina, L.; Wang, J.; Geil, P.; Shim, M.; Rogers, J. A. Polymer Imprint Lithography with Molecular-Scale Resolution Nano Lett. 2004, 4, 2467-2471 (Pubitemid 40002386)
20. Ganesan, R.; Lim, S. H.; Saifullah, M. S. M.; Hussain, H.; Kwok, J. X. Q.; Tse, R. L. X.; Bo, H. A. P.; Low, H. Y. Direct Nanoimprinting of Metal Oxides By in Situ Thermal Co-Polymerization of Their Methacrylates J. Mater. Chem. 2011, 21, 4484-4492
21. 2 Gel Gratings for Optical Applications J. Vac. Sci. Technol. B 2003, 21, 660-663 (Pubitemid 36516595)
22. Matsui, S.; Igaku, Y.; Ishigaki, H.; Fujita, J.; Ishida, M.; Ochiai, Y.; Namatsu, H.; Komuro, M. Room-Temperature Nanoimprint and Nanotransfer Printing Using Hydrogen Silsequioxane J. Vac. Sci. Technol. B 2003, 21, 688-692 (Pubitemid 36516600)
23. Kim, W. S.; Yoon, K. B.; Bae, B. S. Nanopatterning of Photonic Crystals with a Photocurable Silica-Titania Organic-Inorganic Hybrid Material by a UV-Based Nanoimprint Technique J. Mater. Chem. 2005, 15, 4535-4539 (Pubitemid 41642738)
24. Göbel, O. F.; Nedelcu, M.; Steiner, U. Soft Lithography of Ceramic Patterns Adv. Funct. Mater. 2007, 17, 1131-1136 (Pubitemid 46762599)
25. Kwon, S. J.; Park, J. H.; Park, J. G. Selective Growth of ZnO Nanorods by Patterning of Sol-Gel-Derived Thin Film J. Electroceram. 2006, 17, 455-459
26. Hampton, M. J.; Williams, S. S.; Zhou, Z.; Nunes, J.; Ko, D. H.; Templeton, J. L.; Samulski, E. T.; DeSimone, J. M. The Patterning of Sub-500 nm Inorganic Oxide Structures Adv. Mater. 2008, 20, 2667-2673
27. Yang, K.-Y.; Yoon, K.-M.; Choi, K. W.; Lee, H. The Direct Nano-Patterning of ZnO Using Nanoimprint Lithography with ZnO-Sol and Thermal Annealing Microelectron. Eng. 2009, 86, 2228-2231
28. Yang, K.-Y.; Yoon, K.-M.; Lim, S.; Lee, H. Direct Indium Tin Oxide Patterning Using Thermal Nanoimprint Lithography for Highly Efficient Optoelectronic Devices J. Vac. Sci. Technol. B 2009, 27, 2786-2789
29. 2 Nanopattern Using Reverse Imprinting and Sol-Gel Method J. Vac. Sci. Technol. B 2009, 27, 2810-2813
30. Han, H.; Bhushan, A.; Yaghmaie, F.; Davis, C. E. Direct Thermal-UV Nanoimprint of an Iron-Containing Organometallic Hybrid Film J. Vac. Sci. Technol. B 2010, 28, 78-81
31. Â) J. Mater. Chem. 2007, 17, 3575-3580 (Pubitemid 47294589)
32. Kim, E. K.; Stacey, N. A.; Smith, B. J.; Dickey, M. D.; Johnson, S. C.; Trinque, B. C.; Willson, C. G. Vinyl Ethers in Ultraviolet Curable Formulations for Step and Flash Imprint Lithography J. Vac. Sci. Technol. B 2004, 22, 131-135
33. Palmieri, F.; Adams, J.; Long, B.; Heath, W.; Tsiartas, P.; Willson, C. G. Design of Reversible Cross-Linkers for Step and Flash Imprint Lithography Imprint Resists ACS Nano 2007, 1, 307-312
34. Heath, W. H.; Palmieri, F.; Adams, J. R.; Long, B. K.; Chute, J.; Holcombe, T. W.; Zieren, S.; Truitt, M. J.; White, J. L.; Willson, C. G. Degradable Cross-Linkers and Strippable Imaging Materials for Step-and-Flash Imprint Lithography Macromolecules 2008, 41, 719-726 (Pubitemid 351294483)
35. Takei, S. Step and Flash Imprint of Fluorinated Silicon-Containing Resist Materials for Three-Dimensional Nanofabrication Jpn. J. Appl. Phys. 2010, 49, 071602
36. Resnick, D. J.; Sreenivasan, S. V.; Willson, C. G. Step & Flash Imprint Lithography Mater. Today 2005, 8, 34-42 (Pubitemid 40146358)
37. 4 solutions Vib. Spectrosc. 1994, 8, 71-85
38. 2 Nanotubes: Influence of Annealing Time and Temperature Chem. Phys. Lett. 2010, 494, 260-263
39. 2 Sol-Gel Thin Films and the Effect of n-Doping J. Non-Cryst. Solids 2008, 354, 4448-4457
40. 2 Thin Films Prepared by Aqueous Sol-Gel Process at Low Temperature Thin Solid Films 2002, 405, 50-54 (Pubitemid 34182487)
41. 2 Thin Films with Different Microstructures J. Phys. D: Appl. Phys. 2009, 42, 145305
42. Mathur, S.; Kuhn, P. CVD of Titanium Oxide Coatings: Comparative Evaluation of Thermal and Plasma Assisted Processes Surf. Coat. Technol. 2006, 201, 807-814 (Pubitemid 44375545)
43. 2 Granular Thin Films ACS Appl. Mater. Interfaces 2010, 2, 2629-2636
44. Nedelcu, M.; Saifullah, M. S. M.; Hasko, D. G.; Jang, A.; Anderson, D.; Huck, W. T. S.; Jones, G. A. C.; Welland, M. E.; Kang, D. J.; Steiner, U. Fabrication of Sub-10 nm Metallic Lines of Low Line-Width Roughness by Hydrogen Reduction of Patterned Metal-Organic Materials Adv. Funct. Mater. 2010, 20, 2317-2323