New resists for proton beam writing

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 260, Issue 1, 2007, Pages 460-463

  van Kan, J A ^a   Bettiol, A A ^a   Chiam, S Y ^a   Saifullah, M S M ^b,c   Subramanian, K R V ^b   Welland, M E ^b   Watt, F ^a  

^a NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

^b UNIVERSITY OF CAMBRIDGE   (United Kingdom)

^c INSTITUTE OF MATERIALS RESEARCH AND ENGINEERING   (Singapore)

Author keywords

Direct write; High aspect ratio; Proton beam writing; Resist

Indexed keywords

ELECTRON BEAMS; LITHOGRAPHY; MOLECULAR STRUCTURE; PROTON BEAMS; REFRACTIVE INDEX; SENSITIVITY ANALYSIS;

DIRECT WRITE; PROTON BEAM WRITING; SOFT-LITHOGRAPHY;

PHOTORESISTS;

EID: 34249877394     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nimb.2007.02.063     Document Type: Article

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