Formation of TiO2 nanopattern using reverse imprinting and sol-gel method

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 27, Issue 6, 2009, Pages 2810-2813

  Yoon, Kyung Min ^a   Yang, Ki Yeon ^a   Lee, Heon ^a   Kim, Hyeong Seok ^b  

^a Korea University   (South Korea)

^b Chung Ang University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING PROCESS; DIETHANOLAMINE; ETCHING PROCESS; IMPRINT LITHOGRAPHY; IMPRINTING PROCESS; NANO PATTERN; PATTERNING TECHNIQUES; POLYCRYSTALLINE; POLYCRYSTALLINE PHASE; POLYMER MOLDS; PROCESS STEPS; SOL-GEL METHODS; TIO; WIDE BAND GAP;

ETHANOL; GELS; PHOTOLITHOGRAPHY; SILICONES; SOL-GEL PROCESS; SOL-GELS; SOLS;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 72849139197     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.3246394     Document Type: Conference Paper

References (18)

1. Yong Cheol Hong, Chan Uk Bang, Dong Hun Shin, and Han Sup Uhm, Chem. Phys. Lett. 413, 454 (2005).
2. D. Mergel, D. Buschendorf, S. Eggert, R. Grammes, and B. Samset, Thin Solid Films 371, 218 (2000).
3. C. Garzella, E. Comini, E. Tempesti, C. Frigeri, and G. Sberveglieri, Sens. Actuators B 68, 189 (2000).
4. M. Ferroni, V. Guidi, G. Martinelli, G. Faglia, P. Nelli, and G. Sberveglieri, Nanostruct. Mater. 7, 709 (1996).
5. B. O'Regan and M. Grätzel, Nature (London) 353, 737 (1991).
6. Man Gu Kang, Nam-Gyu Park, Kwang Sun Ryu, Soon Ho Chang, and Kang-Jin Kim, Sol. Energy Mater. Sol. Cells 90, 574 (2006).
7. K. D. Rogers, D. W. Lane, J. D. Painter, and A. Chapman, Thin Solid Films 466, 97 (2004).
8. Kai Zhu, Nathan R. Neale, Alexander Miedaner, and Arthur J. Frank, Nano Lett. 7, 69 (2007).
9. Min Woo Park and Ki Young Chun, Electron. Mater. Lett. 5, 7 (2009).
10. E. Reck and S. Seymour, Macromol. Symp. 187, 707 (2002).
11. T. A. Truong, L. M. Campos, E. Matioli, I. Meinel, C. J. Hawker, C. Weisbuch, and P. M. Petroff, Appl. Phys. Lett. 94, 023101 (2009).
12. X. Wang, M. Fujimaki, and K. Awazu, Opt. Express 13, 1486 (2005).
13. D. P. Gaillot, E. Graugnard, J. Blair, and C. J. Summers, Appl. Phys. Lett. 91, 181123 (2007).
14. C. Peroz, V. Chauveau, E. Barthel, and E. Søndergård, Adv. Mater. (Weinheim, Ger.) 21, 555 (2009).
15. J. Yu, X. Zhao, and Q. Zhao, Thin Solid Films 379, 7 (2000).
16. N. Kehagias, M. Zelsmann, C. M. Sotomayor Torres, K. Pfeiffer, G. Ahrens, and G. Gruetzner, J. Vac. Sci. Technol. B 23, 2954 (2005).
17. W. M. Choi and O. O. Park, Microelectron. Eng. 70, 131 (2003).
18. J. Zaumseil, M. A. Meitl, J. W. P. Hsu, B. R. Acharya, K. W. Baldwin, Y. L. Loo, and J. A. Rogers, Nano Lett. 3, 1223 (2003).