SCOPUS 정보 검색 플랫폼

Microelectronic Engineering

Volumn 86, Issue 11, 2009, Pages 2228-2231

The direct nano-patterning of ZnO using nanoimprint lithography with ZnO-sol and thermal annealing

(4) Yang, Ki Yeon a Yoon, Kyung Min a Choi, Kyung Woo b Lee, Heon a

a Korea University (South Korea)

b Korea Institute of Nuclear Safety (KINS) (South Korea)

Author keywords

Nanoimprint lithography; ZnO nano pattern; ZnO gel; ZnO sol

Indexed keywords

IMPRINTING PROCESS; NANO PATTERN; NANOPATTERNING; OXIDIZED SI WAFERS; POLYMER BASED; SEM; TEM; THERMAL-ANNEALING; ZNO; ZNO LAYERS; ZNO NANO-PATTERN; ZNO-GEL; ZNO-SOL;

ANNEALING; GELATION; GELS; MOLDS; NANOIMPRINT LITHOGRAPHY; ORGANIC SOLVENTS; POLYMERS; RESINS; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING INDIUM COMPOUNDS; SEMICONDUCTING SILICON COMPOUNDS; SILICON WAFERS; SOLS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION; ZINC OXIDE;

SEMICONDUCTING ZINC COMPOUNDS;

EID: 69749101533 PISSN: 01679317 EISSN: None Source Type: Journal
DOI: 10.1016/j.mee.2009.03.078 Document Type: Article

Times cited : (56)

References (12)

1
- 0037418379
- Xia Y., Yang P., Sun Y., Wu Y., Mayers B., Gates B., Yin Y., Kim F., and Yan H. Adv. Mater. 15 (2003) 353
- (2003) Adv. Mater. , vol.15 , pp. 353
- Xia, Y.¹ Yang, P.² Sun, Y.³ Wu, Y.⁴ Mayers, B.⁵ Gates, B.⁶ Yin, Y.⁷ Kim, F.⁸ Yan, H.⁹

2
- 33749379230
- Aranovich J.A., Golmayo D., Fechrenbruch A.L., and Bube R.H. J. Appl. Phys. 51 (1980) 460-468
- (1980) J. Appl. Phys. , vol.51 , pp. 460-468
- Aranovich, J.A.¹ Golmayo, D.² Fechrenbruch, A.L.³ Bube, R.H.⁴

3
- 0033704990
- Xu J.Q., Pan Y.Q., Shun Y.A., and Tian Z.-Z. Sens. Actuators, A 66 (2000) 277-299
- (2000) Sens. Actuators, A , vol.66 , pp. 277-299
- Xu, J.Q.¹ Pan, Y.Q.² Shun, Y.A.³ Tian, Z.-Z.⁴

4
- 0035333303
- Liang S., Sheng H., Liu Y., Huo Z., Lua Y., and Shen H. J. Cryst. Growth 225 (2001) 110-113
- (2001) J. Cryst. Growth , vol.225 , pp. 110-113
- Liang, S.¹ Sheng, H.² Liu, Y.³ Huo, Z.⁴ Lua, Y.⁵ Shen, H.⁶

5
- 42749101314
- Shalish I., Temkin H., and Narayanamurti V. Phys. Rev. B 69 (2004) 245401
- (2004) Phys. Rev. B , vol.69 , pp. 245401
- Shalish, I.¹ Temkin, H.² Narayanamurti, V.³

6
- 0012752163
- Chou S.Y., Krauss P.R., Zhang W., Guo L., and Zhuang L. J. Vac. Sci. Technol. B 15 (1997) 2897
- (1997) J. Vac. Sci. Technol. B , vol.15 , pp. 2897
- Chou, S.Y.¹ Krauss, P.R.² Zhang, W.³ Guo, L.⁴ Zhuang, L.⁵

7
- 2042440427
- Farley N.R.S., Staddon C.R., Zhao L., Edmonds K.W., Gallagher B.L., and Gregory D.H. J. Mater. Chem. 14 (2004) 1087-1092
- (2004) J. Mater. Chem. , vol.14 , pp. 1087-1092
- Farley, N.R.S.¹ Staddon, C.R.² Zhao, L.³ Edmonds, K.W.⁴ Gallagher, B.L.⁵ Gregory, D.H.⁶

8
- 38849121116
- Suh K.Y., Kim Y.S., and Lee H.H. Adv. Mater. 13 18 (2001) 1386-1389
- (2001) Adv. Mater. , vol.13 , Issue.18 , pp. 1386-1389
- Suh, K.Y.¹ Kim, Y.S.² Lee, H.H.³

9
- 1842534439
- Jung G.Y., Ganapathiappan S., Li X., Ohlberg D.A.A., Olynick D.L., Chen Y., Tong W.M., and Williams R.S. Appl. Phys. A 78 (2004) 1169
- (2004) Appl. Phys. A , vol.78 , pp. 1169
- Jung, G.Y.¹ Ganapathiappan, S.² Li, X.³ Ohlberg, D.A.A.⁴ Olynick, D.L.⁵ Chen, Y.⁶ Tong, W.M.⁷ Williams, R.S.⁸

10
- 29144524884
- Kang H.W., Lee J.Y., Park J.H., and Lee H.H. Nanotechnology 17 (2006) 197-200
- (2006) Nanotechnology , vol.17 , pp. 197-200
- Kang, H.W.¹ Lee, J.Y.² Park, J.H.³ Lee, H.H.⁴

11
- 9644291750
- Lee H., and Jung G.Y. Microelectron. Eng. 77 (2005) 42-47
- (2005) Microelectron. Eng. , vol.77 , pp. 42-47
- Lee, H.¹ Jung, G.Y.²

12
- 0141793154
- Kim H.K., Bae J.W., Kim T.K., Kim K.K., Seong T.Y., and Adesida I. J. Vac. Sci. Technol. B. 21 4 (2003) 1273-1277
- (2003) J. Vac. Sci. Technol. B. , vol.21 , Issue.4 , pp. 1273-1277
- Kim, H.K.¹ Bae, J.W.² Kim, T.K.³ Kim, K.K.⁴ Seong, T.Y.⁵ Adesida, I.⁶

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.