메뉴 건너뛰기




Volumn 98, Issue , 2012, Pages 370-378

Microcrystalline silicon carbide window layers in thin film silicon solar cells

Author keywords

c Si:H solar cell; Microcrystalline silicon carbide; Thin film; Window layer

Indexed keywords

ABSORBER LAYERS; CRYSTALLINE SILICONS; DEPOSITION TEMPERATURES; DEVICE DESIGN; HIGH POTENTIAL; HOT WIRE CHEMICAL VAPOR DEPOSITION; LOW SUBSTRATE TEMPERATURE; MONOMETHYLSILANE; RESEARCH AND DEVELOPMENT; SINGLE JUNCTION; THIN-FILM SILICON SOLAR CELLS; THIN-FILM SOLAR CELLS; TRANSPARENT CONDUCTIVE; WIDE OPTICAL GAP; WINDOW LAYER;

EID: 84855323683     PISSN: 09270248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.solmat.2011.11.039     Document Type: Article
Times cited : (34)

References (34)
  • 2
    • 0001627677 scopus 로고    scopus 로고
    • Low temperature chemical vapor deposition growth of β-SiC on (100) Si using methylsilane and device characteristics
    • C.W. Liu, and J.C. Sturm Low temperature chemical vapor deposition growth of beta-SiC on (1 0 0) Si using methylsilane and device characteristics Journal of Applied Physics 82 1997 4558 4565 (Pubitemid 127584862)
    • (1997) Journal of Applied Physics , vol.82 , Issue.9 , pp. 4558-4565
    • Liu, C.W.1    Sturm, J.C.2
  • 3
    • 0001375967 scopus 로고
    • Highly conductive and wide optical band-gap n-type μc-SiC prepared by electron-cyclotron resonance plasma enhanced chemical vapor deposition
    • T. Futagi, M. Katsuno, N. Ohtani, Y. Ohta, H. Mimura, and K. Kawamura Highly conductive and wide optical band-gap n-type μc-SiC prepared by electron-cyclotron resonance plasma enhanced chemical vapor deposition Applied Physics Letters 58 1991 2948 2950
    • (1991) Applied Physics Letters , vol.58 , pp. 2948-2950
    • Futagi, T.1    Katsuno, M.2    Ohtani, N.3    Ohta, Y.4    Mimura, H.5    Kawamura, K.6
  • 4
    • 0242317265 scopus 로고    scopus 로고
    • Low temperature deposition of nanocrystalline silicon carbide films by plasma enhanced chemical vapor deposition and their structural and optical characterization
    • T. Rajagopalan, X. Wang, B. Lahlouh, C. Ramkumar, P. Dutta, and S. Gangopadhyay Low temperature deposition of nanocrystalline silicon carbide films by plasma enhanced chemical vapor deposition and their structural and optical characterization Journal of Applied Physics 94 2003 5252 5260
    • (2003) Journal of Applied Physics , vol.94 , pp. 5252-5260
    • Rajagopalan, T.1    Wang, X.2    Lahlouh, B.3    Ramkumar, C.4    Dutta, P.5    Gangopadhyay, S.6
  • 5
    • 55049101191 scopus 로고    scopus 로고
    • Effect of plasma power on structure of hydrogenated nanocrystalline cubic silicon carbide films deposited by very high frequency plasma-enhanced chemical vapor deposition at a low substrate temperature
    • S. Miyajima, M. Sawamura, A. Yamada, and M. Konagai Effect of plasma power on structure of hydrogenated nanocrystalline cubic silicon carbide films deposited by very high frequency plasma-enhanced chemical vapor deposition at a low substrate temperature Japanese Journal of Applied Physics 47 2008 3368 3371
    • (2008) Japanese Journal of Applied Physics , vol.47 , pp. 3368-3371
    • Miyajima, S.1    Sawamura, M.2    Yamada, A.3    Konagai, M.4
  • 6
    • 0000395353 scopus 로고    scopus 로고
    • Low temperature deposition of nanocrystalline silicon carbide thin films
    • S. Kerdiles, A. Berthelot, F. Gourbilleau, and R. Rizk Low temperature deposition of nanocrystalline silicon carbide thin films Applied Physics Letters 76 2000 2373 2375
    • (2000) Applied Physics Letters , vol.76 , pp. 2373-2375
    • Kerdiles, S.1    Berthelot, A.2    Gourbilleau, F.3    Rizk, R.4
  • 7
    • 33646492531 scopus 로고    scopus 로고
    • Low-temperature deposition of highly conductive n-type hydrogenated nanocrystalline cubic SiC films for solar cell applications
    • S. Miyajima, K. Haga, A. Yamada, and M. Konagai Low-temperature deposition of highly conductive n-type hydrogenated nanocrystalline cubic SiC films for solar cell applications Japanese Journal of Applied Physics 45 2006 L432 L434
    • (2006) Japanese Journal of Applied Physics , vol.45
    • Miyajima, S.1    Haga, K.2    Yamada, A.3    Konagai, M.4
  • 8
    • 32644446294 scopus 로고    scopus 로고
    • Low substrate temperature deposition of crystalline SiC using HWCVD
    • DOI 10.1016/j.tsf.2005.07.180, PII S0040609005010503, Proceedings of the Third International Conference on Hot-Wire
    • S. Klein, R. Carius, F. Finger, and L. Houben Low substrate temperature deposition of crystalline SiC using HWCVD Thin Solid Films 501 2006 169 172 (Pubitemid 43243007)
    • (2006) Thin Solid Films , vol.501 , Issue.1-2 , pp. 169-172
    • Klein, S.1    Carius, R.2    Finger, F.3    Houben, L.4
  • 9
    • 30344461895 scopus 로고    scopus 로고
    • Low-temperature growth of polycrystalline SiC by catalytic CVD from monomethylsilane
    • DOI 10.1016/j.mee.2005.10.052, PII S016793170500479X
    • T. Kaneko, Y. Hosokawa, T. Suga, and N. Miyakawa Low-temperature growth of polycrystalline SiC by catalytic CVD from monomethylsilane Microelectronic Engineering 83 2006 41 44 (Pubitemid 43065182)
    • (2006) Microelectronic Engineering , vol.83 , pp. 41-44
    • Kaneko, T.1    Hosokawa, Y.2    Suga, T.3    Miyakawa, N.4
  • 10
    • 33744550457 scopus 로고    scopus 로고
    • Structural properties of microcrystalline SiC deposited at low substrate temperatures by HWCVD
    • DOI 10.1016/j.jnoncrysol.2006.01.047, PII S002230930600250X
    • S. Klein, L. Houben, R. Carius, F. Finger, and W. Fischer Structural properties of microcrystalline SiC deposited at low substrate temperatures by HWCVD Journal of Non-Crystalline Solids 352 2006 1376 1379 (Pubitemid 43816500)
    • (2006) Journal of Non-Crystalline Solids , vol.352 , pp. 1376-1379
    • Klein, S.1    Houben, L.2    Carius, R.3    Finger, F.4    Fischer, W.5
  • 11
    • 36749003238 scopus 로고    scopus 로고
    • Electronic properties of low temperature microcrystalline silicon carbide prepared by Hot Wire CVD
    • DOI 10.1016/j.tsf.2007.06.056, PII S0040609007009571, Proceedings of the Fourth International Conference on Hot-Wire Cat-CVD Process
    • S. Klein, A. Dasgupta, F. Finger, R. Carius, and T. Bronger Electronic properties of low temperature microcrystalline silicon carbide prepared by Hot Wire CVD Thin Solid Films 516 2008 630 632 (Pubitemid 350212994)
    • (2008) Thin Solid Films , vol.516 , Issue.5 , pp. 630-632
    • Klein, S.1    Dasgupta, A.2    Finger, F.3    Carius, R.4    Bronger, T.5
  • 12
    • 36749060765 scopus 로고    scopus 로고
    • Effect of filament and substrate temperatures on the structural and electrical properties of SiC thin films grown by the HWCVD technique
    • DOI 10.1016/j.tsf.2007.06.077, PII S0040609007009236, Proceedings of the Fourth International Conference on Hot-Wire Cat-CVD Process
    • A. Dasgupta, Y. Huang, L. Houben, S. Klein, F. Finger, R. Carius, and M. Luysberg Effect of filament and substrate temperatures on the structural and electrical properties of SiC thin films grown by the HWCVD technique Thin Solid Films 516 2008 622 625 (Pubitemid 350212979)
    • (2008) Thin Solid Films , vol.516 , Issue.5 , pp. 622-625
    • Dasgupta, A.1    Huang, Y.2    Houben, L.3    Klein, S.4    Finger, F.5    Carius, R.6    Luysberg, M.7
  • 13
    • 36749054628 scopus 로고    scopus 로고
    • Microstructure of highly crystalline silicon carbide thin films grown by HWCVD technique
    • DOI 10.1016/j.tsf.2007.06.055, PII S0040609007009674, Proceedings of the Fourth International Conference on Hot-Wire Cat-CVD Process
    • A. Dasgupta, S. Klein, L. Houben, R. Carius, F. Finger, and M. Luysberg Microstructure of highly crystalline silicon carbide thin films grown by HWCVD technique Thin Solid Films 516 2008 618 621 (Pubitemid 350213003)
    • (2008) Thin Solid Films , vol.516 , Issue.5 , pp. 618-621
    • Dasgupta, A.1    Klein, S.2    Houben, L.3    Carius, R.4    Finger, F.5    Luysberg, M.6
  • 14
    • 79958788913 scopus 로고    scopus 로고
    • Microstructure and electronic properties of microcrystalline silicon carbide thin films prepared by hot-wire CVD
    • T. Chen, F. Köhler, A. Heidt, Y. Huang, F. Finger, and R. Carius Microstructure and electronic properties of microcrystalline silicon carbide thin films prepared by hot-wire CVD Thin Solid Films 519 2011 4511 4515
    • (2011) Thin Solid Films , vol.519 , pp. 4511-4515
    • Chen, T.1    Köhler, F.2    Heidt, A.3    Huang, Y.4    Finger, F.5    Carius, R.6
  • 15
    • 64649090130 scopus 로고    scopus 로고
    • Microcrystalline silicon carbide thin films grown by HWCVD at different filament temperatures and their application in nip microcrystalline silicon solar cells
    • T. Chen, Y.L. Huang, H.Y. Wang, D.R. Yang, A. Dasgupta, R. Carius, and F. Finger Microcrystalline silicon carbide thin films grown by HWCVD at different filament temperatures and their application in nip microcrystalline silicon solar cells Thin Solid Films 517 2009 3513 3515
    • (2009) Thin Solid Films , vol.517 , pp. 3513-3515
    • Chen, T.1    Huang, Y.L.2    Wang, H.Y.3    Yang, D.R.4    Dasgupta, A.5    Carius, R.6    Finger, F.7
  • 17
    • 34249069559 scopus 로고    scopus 로고
    • Highly transparent microcrystalline silicon carbide grown with hot wire chemical vapor deposition as window layers in nip microcrystalline silicon solar cells
    • Y. Huang, A. Dasgupta, A. Gordijn, F. Finger, and R. Carius Highly transparent microcrystalline silicon carbide grown with hot wire chemical vapor deposition as window layers in nip microcrystalline silicon solar cells Applied Physics Letters 90 2007 203502
    • (2007) Applied Physics Letters , vol.90 , pp. 203502
    • Huang, Y.1    Dasgupta, A.2    Gordijn, A.3    Finger, F.4    Carius, R.5
  • 18
    • 34547841880 scopus 로고    scopus 로고
    • Characterization of undoped, N- and P-type hydrogenated nanocrystalline silicon carbide films deposited by hot-wire chemical vapor deposition at low temperatures
    • DOI 10.1143/JJAP.46.1415
    • S. Miyajima, A. Yamada, and M. Konagai Characterization of undoped, n- and p-type hydrogenated nanocrystalline silicon carbide films deposited by hot-wire chemical vapor deposition at low temperatures Japanese Journal of Applied Physics 46 2007 1415 1426 (Pubitemid 47252704)
    • (2007) Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers , vol.46 , Issue.4 A , pp. 1415-1426
    • Miyajima, S.1    Yamada, A.2    Konagai, M.3
  • 19
    • 77952617433 scopus 로고    scopus 로고
    • Highly conductive p-type silicon carbon alloys deposited by hot-wire chemical vapor deposition
    • T. Chen, D.R. Yang, R. Carius, and F. Finger Highly conductive p-type silicon carbon alloys deposited by hot-wire chemical vapor deposition Japanese Journal of Applied Physics 49 2010 041303
    • (2010) Japanese Journal of Applied Physics , vol.49 , pp. 041303
    • Chen, T.1    Yang, D.R.2    Carius, R.3    Finger, F.4
  • 20
    • 79958827762 scopus 로고    scopus 로고
    • Aluminum doped silicon carbide thin films prepared by hot-wire CVD: Influence of the substrate temperature on material properties
    • T. Chen, D. Yang, R. Carius, and F. Finger Aluminum doped silicon carbide thin films prepared by hot-wire CVD: influence of the substrate temperature on material properties Thin Solid Films 519 2011 4516 4518
    • (2011) Thin Solid Films , vol.519 , pp. 4516-4518
    • Chen, T.1    Yang, D.2    Carius, R.3    Finger, F.4
  • 21
    • 79958827762 scopus 로고    scopus 로고
    • Aluminum doped silicon carbide thin films prepared by hot-wire CVD: Investigation of defects with electron spin resonance
    • L. Xiao, O. Astakhov, T. Chen, M. Stutzmann, and F. Finger Aluminum doped silicon carbide thin films prepared by hot-wire CVD: investigation of defects with electron spin resonance Thin Solid Films 519 2011 4519 4522
    • (2011) Thin Solid Films , vol.519 , pp. 4519-4522
    • Xiao, L.1    Astakhov, O.2    Chen, T.3    Stutzmann, M.4    Finger, F.5
  • 22
    • 24144475019 scopus 로고    scopus 로고
    • Hole drift-mobility measurements in microcrystalline silicon
    • T. Dylla, F. Finger, and E.A. Schiff Hole drift-mobility measurements in microcrystalline silicon Applied Physics Letters 87 2005 032103
    • (2005) Applied Physics Letters , vol.87 , pp. 032103
    • Dylla, T.1    Finger, F.2    Schiff, E.A.3
  • 26
    • 23844507299 scopus 로고    scopus 로고
    • Deposition of microcrystalline silicon prepared by hot-wire chemical-vapor deposition: The influence of the deposition parameters on the material properties and solar cell performance
    • S. Klein, F. Finger, R. Carius, and M. Stutzmann Deposition of microcrystalline silicon prepared by hot-wire chemical-vapor deposition: the influence of the deposition parameters on the material properties and solar cell performance Journal of Applied Physics 98 2005 024905
    • (2005) Journal of Applied Physics , vol.98 , pp. 024905
    • Klein, S.1    Finger, F.2    Carius, R.3    Stutzmann, M.4
  • 27
    • 43049127207 scopus 로고    scopus 로고
    • Preparation of microcrystalline silicon solar cells on microcrystalline silicon carbide window layers grown with HWCVD at low temperature
    • Y. Huang, T. Chen, A. Gordijn, A. Dasgupta, F. Finger, and R. Carius Preparation of microcrystalline silicon solar cells on microcrystalline silicon carbide window layers grown with HWCVD at low temperature Journal of Non-Crystalline Solids 354 2008 2430 2434
    • (2008) Journal of Non-Crystalline Solids , vol.354 , pp. 2430-2434
    • Huang, Y.1    Chen, T.2    Gordijn, A.3    Dasgupta, A.4    Finger, F.5    Carius, R.6
  • 28
    • 0033170236 scopus 로고    scopus 로고
    • Texture etched ZnO:Al coated glass substrates for silicon based thin film solar cells
    • DOI 10.1016/S0040-6090(99)00085-1
    • O. Kluth, B. Rech, L. Houben, S. Wieder, G. Schope, C. Beneking, H. Wagner, A. Loffl, and H.W. Schock Texture etched ZnO:Al coated glass substrates for silicon based thin film solar cells Thin Solid Films 351 1999 247 253 (Pubitemid 32213766)
    • (1999) Thin Solid Films , vol.351 , Issue.1-2 , pp. 247-253
    • Kluth, O.1    Rech, B.2    Houben, L.3    Wieder, S.4    Schope, G.5    Beneking, C.6    Wagner, H.7    Loffl, A.8    Schock, H.W.9
  • 29
    • 0032105305 scopus 로고    scopus 로고
    • Structural properties of microcrystalline silicon in the transition from highly crystalline to amorphous growth
    • L. Houben, M. Luysberg, P. Hapke, R. Carius, F. Finger, and H. Wagner Structural properties of microcrystalline silicon in the transition from highly crystalline to amorphous growth Philosophical Magazine A 77 1998 1447 1460
    • (1998) Philosophical Magazine A , vol.77 , pp. 1447-1460
    • Houben, L.1    Luysberg, M.2    Hapke, P.3    Carius, R.4    Finger, F.5    Wagner, H.6
  • 30
    • 0345849822 scopus 로고    scopus 로고
    • Nucleation and growth analysis of microcrystalline silicon by scanning probe microscopy: Substrate dependence, local structural, and electronic properties of as-grown surfaces
    • C. Ross, J. Herion, and H. Wagner Nucleation and growth analysis of microcrystalline silicon by scanning probe microscopy: substrate dependence, local structural, and electronic properties of as-grown surfaces Journal of Non-Crystalline Solids 266 2000 69 73
    • (2000) Journal of Non-Crystalline Solids , vol.266 , pp. 69-73
    • Ross, C.1    Herion, J.2    Wagner, H.3
  • 31
    • 30544450478 scopus 로고    scopus 로고
    • Structure of microcrystalline solar cell materials: What can we learn from electron microscopy?
    • A24.1, Amorphous and Nanocrystalline Silicon Science and Technology 2005
    • M. Luysberg, and L. Houben Structure of microcrystalline solar cell materials: what can we learn from electron microscopy? Materials Research Society Symposium Proceedings 862 2005 123 131 (Pubitemid 43079682)
    • (2005) Materials Research Society Symposium Proceedings , vol.862 , pp. 123-131
    • Luysberg, M.1    Houben, L.2
  • 32
    • 0036531441 scopus 로고    scopus 로고
    • Growth of microcrystalline nip Si solar cells: Role of local epitaxy
    • DOI 10.1016/S0022-3093(01)01138-3, PII S0022309301011383, Suppl. 2
    • L. Houben, C. Scholten, M. Luysberg, O. Vetterl, F. Finger, and R. Carius Growth of microcrystalline nip Si solar cells: role of local epitaxy Journal of Non-Crystalline Solids 299 2002 1189 1193 (Pubitemid 34405851)
    • (2002) Journal of Non-Crystalline Solids , vol.299-302 , Issue.PART 2 , pp. 1189-1193
    • Houben, L.1    Scholten, C.2    Luysberg, M.3    Vetterl, O.4    Finger, F.5    Carius, R.6
  • 33
    • 36749008493 scopus 로고    scopus 로고
    • High efficiency microcrystalline silicon solar cells with Hot-Wire CVD buffer layer
    • DOI 10.1016/j.tsf.2007.06.109, PII S0040609007009182, Proceedings of the Fourth International Conference on Hot-Wire Cat-CVD Process
    • F. Finger, Y. Mai, S. Klein, and R. Carius High efficiency microcrystalline silicon solar cells with hot-wire CVD buffer layer Thin Solid Films 516 2008 728 732 (Pubitemid 350212978)
    • (2008) Thin Solid Films , vol.516 , Issue.5 , pp. 728-732
    • Finger, F.1    Mai, Y.2    Klein, S.3    Carius, R.4
  • 34
    • 70449497969 scopus 로고    scopus 로고
    • Microcrystal line siliconcarbon alloys as anti-reflection window layers in high efficiency thin film silicon solar cells
    • T. Chen, Y. Huang, D. Yang, R. Carius, and F. Finger Microcrystal line siliconcarbon alloys as anti-reflection window layers in high efficiency thin film silicon solar cells Physica Status Solidi-R 2 2008 160 162
    • (2008) Physica Status Solidi-R , vol.2 , pp. 160-162
    • Chen, T.1    Huang, Y.2    Yang, D.3    Carius, R.4    Finger, F.5


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.