Electronic properties of low temperature microcrystalline silicon carbide prepared by Hot Wire CVD

Thin Solid Films

Volumn 516, Issue 5, 2008, Pages 630-632

  Klein, Stefan ^a   Dasgupta, Arup ^a   Finger, Friedhelm ^a   Carius, Reinhard ^a   Bronger, Torsten ^a  

^a FORSCHUNGSZENTRUM JÜLICH   (Germany)

Author keywords

Electronic properties; Hot Wire chemical vapor deposition; Microcrystalline SiC; Optical absorption; Spin density

Indexed keywords

CHEMICAL VAPOR DEPOSITION; DILUTION; LIGHT ABSORPTION; LOW TEMPERATURE EFFECTS; MICROCRYSTALLINE SILICON; VOLUME FRACTION;

HOT WIRE CHEMICAL VAPOR DEPOSITION; MICROCRYSTALLINE SIC; SPIN DENSITY; SUB-GAP ABSORPTION; SUBSTRATE TEMPERATURES;

SILICON CARBIDE;

EID: 36749003238     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2007.06.056     Document Type: Article

References (9)

1. Liu C.W., and Sturm J.C. J. Appl. Phys. 82 (1997) 4558
2. Hattori Y., Kruangam D., Toyama T., Okamoto H., and Hamakawa Y. Appl. Surf. Sci. 33/34 (1988) 1276
3. Kerdiles S., Berthelot A., Gourbilleau F., and Rizk R. Appl. Phys. Lett. 76 (2000) 2373
4. Rajagopalan T., Wang X., Lahlouh B., Ramkumar C., Dutta P., and Gangopadhyay S. J. Appl. Phys. 94 (2003) 5252
5. Miyajima S., Yamada A., and Konagai M. Proc. 3rd World Conf. Photovoltaic Energy Conversion, Osaka (2003) 5P-A9-24
6. Klein S., Carius R., Finger F., and Houben L. Thin Solid Films 501 (2006) 169
7. Klein S., Houben L., Carius R., Finger F., and Fischer W. J. Non-Cryst. Solids 352 (2006) 1376
8. A. Dasgupta, S. Klein, L. Houben, R. Carius, F. Finger and M. Luysberg, "Microstructure of highly crystalline silicon carbide thin films grown by HWCVD technique", this conference.
9. Klein S., Finger F., Carius R., and Stutzmann M. J. Appl. Phys. 98 (2005) 024905