Structural properties of microcrystalline SiC deposited at low substrate temperatures by HWCVD

Journal of Non-Crystalline Solids

Volumn 352, Issue 9-20 SPEC. ISS., 2006, Pages 1376-1379

  Klein, S ^a   Houben, L ^a   Carius, R ^a   Finger, F ^a   Fischer, W ^a  

^a FORSCHUNGSZENTRUM JÜLICH   (Germany)

Author keywords

Chemical vapor deposition; Microcrystallinity; Raman scattering; TEM STEM

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CRYSTALLINE MATERIALS; CRYSTALLOGRAPHY; GLASS; RAMAN SCATTERING; X RAY DIFFRACTION ANALYSIS;

MICROCRYSTALLINITY; SILICON SUBSTRATES; TEM/STEM;

SILICON CARBIDE;

EID: 33744550457     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jnoncrysol.2006.01.047     Document Type: Article

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