High efficiency microcrystalline silicon solar cells with Hot-Wire CVD buffer layer

Thin Solid Films

Volumn 516, Issue 5, 2008, Pages 728-732

  Finger, F ^a   Mai, Y ^a,b   Klein, S ^a   Carius, R ^a  

^a FORSCHUNGSZENTRUM JÜLICH   (Germany)

^b NANKAI UNIVERSITY   (China)

Author keywords

Deposition rates; Hot Wire CVD; Interface treatment; Microcrystalline silicon; PECVD; Solar cells

Indexed keywords

BUFFER LAYERS; DEPOSITION RATES; MICROCRYSTALLINE SILICON; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

HOT-WIRE CVD; INTERFACE TREATMENT;

SOLAR CELLS;

EID: 36749008493     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2007.06.109     Document Type: Article

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