Microstructure of highly crystalline silicon carbide thin films grown by HWCVD technique

Thin Solid Films

Volumn 516, Issue 5, 2008, Pages 618-621

  Dasgupta, A ^a   Klein, S ^a   Houben, L ^a   Carius, R ^a   Finger, F ^a   Luysberg, M ^a  

^a FORSCHUNGSZENTRUM JÜLICH   (Germany)

Author keywords

Electron microscopy; Hot wire deposition; Microstructure; Raman spectroscopy; Silicon carbide

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CRYSTALLINE MATERIALS; ELECTRON MICROSCOPY; MICROSTRUCTURE; RAMAN SPECTROSCOPY; SILICON CARBIDE;

CRYSTALLINE SILICON CARBIDE FILMS; HOT-WIRE DEPOSITION;

THIN FILMS;

EID: 36749054628     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2007.06.055     Document Type: Article

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