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Japanese Journal of Applied Physics

Volumn 50, Issue 12, 2011, Pages

Extreme ultraviolet resist fabricated using water wheel-like cyclic oligomer with pendant adamantyl ester groups

(5) Seki, Hiroyuki a Kudo, Hiroto a Oizumi, Hiroaki b Itani, Toshiro b Nishikubo, Tadatomi a

a KANAGAWA UNIVERSITY (Japan)

b SEMICONDUCTOR LEADING EDGE TECHNOLOGIES INC (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CYCLIC OLIGOMERS; ESTER GROUPS; EUV RESISTS; EXTREME ULTRAVIOLET; EXTREME ULTRAVIOLETS; FEED RATIOS; FILM-FORMING; LINE-AND-SPACE PATTERNS; LINEWIDTH ROUGHNESS; REACTION CONCENTRATION; RESIST MATERIALS;

ESTERIFICATION; ESTERS; OLIGOMERS; SYNTHESIS (CHEMICAL); WHEELS;

ROUGHNESS MEASUREMENT;

EID: 82955227963 PISSN: 00214922 EISSN: 13474065 Source Type: Journal
DOI: 10.1143/JJAP.50.121602 Document Type: Article

Times cited : (6)

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