A fundamental study on dissolution behavior of high-resolution molecular glass photoresists

Chemistry of Materials

Volumn 20, Issue 23, 2008, Pages 7292-7300

  De Silva, Anuja ^a   Sundberg, Linda K ^b   Ito, Hiroshi ^b   Sooriyakumaran, Ratnam ^b   Allen, Robert D ^b   Ober, Christopher K ^c  

^a Department of Obstetrics Gynecology   (United States)

^b IBM ALMADEN RESEARCH CENTER   (United States)

^c Cornell University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS CHARACTERS; BRANCHED ARCHITECTURES; DE PROTECTIONS; DEVELOPER CONCENTRATIONS; DISSOLUTION BEHAVIORS; HIGH RESOLUTIONS; HYDROPHOBIC NATURES; HYDROXYSTYRENE; MOLECULAR GLASS PHOTORESISTS; MOLECULAR GLASSES; PHOTORESIST MATERIALS; POSITIVE TONES; POST EXPOSURES; PROCESSING CONDITIONS; PROTECTION LEVELS; RESIST FILMS; RESIST MATERIALS; RING ARCHITECTURES; SMOOTH TRANSITIONS; STRUCTURAL EFFECTS; SWELLING BEHAVIORS; TWO TYPES;

ELECTRON BEAM LITHOGRAPHY; GLASS; HYDROPHILICITY; PHENOLS; PHOTORESISTORS; QUANTUM CHEMISTRY; SURFACE TREATMENT;

DISSOLUTION;

EID: 57949093256     PISSN: 08974756     EISSN: None     Source Type: Journal    
DOI: 10.1021/cm802295y     Document Type: Article

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