Synthesis of metal oxide thin films by reactive magnetron sputtering in Ar/O2 mixtures: An experimental study of the chemical mechanisms

Plasma Processes and Polymers

Volumn 4, Issue 2, 2007, Pages 113-126

  Snyders, Rony ^a   Dauchot, Jean Pierre ^a   Hecq, Michel ^a  

^a UNIVERSITY OF MONS   (Belgium)

Author keywords

Atomic oxygen; Ionized reactive magnetron sputtering; Mass spectrometry; Reactive magnetron sputtering; XPS

Indexed keywords

CONDENSATION; DEPOSITION RATES; MAGNETRON SPUTTERING; MASS SPECTROMETRY; OXIDE FILMS; SYNTHESIS (CHEMICAL); X RAY PHOTOELECTRON SPECTROSCOPY;

IONIZED REACTIVE MAGNETRON SPUTTERING (IRMS); METAL OXIDE THIN FILMS; REACTIVE MAGNETRON SPUTTERING (RMS);

THIN FILMS;

EID: 33947200814     PISSN: 16128850     EISSN: 16128869     Source Type: Journal    
DOI: 10.1002/ppap.200600103     Document Type: Article

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