Increasing the deposition rate of oxide films by increasing the plasma reactivity

Surface and Coatings Technology

Volumn 200, Issue 1-4 SPEC. ISS., 2005, Pages 448-452

  Snyders, Rony ^a   Gouttebaron, R ^a   Dauchot, J P ^a   Hecq, M ^a  

^a UNIVERSITY OF MONS   (Belgium)

Author keywords

Deposition rate; Reactive sputtering; RF coil amplification

Indexed keywords

ARGON; COMPOSITION EFFECTS; FILMS; MASS SPECTROMETRY; OXIDATION; PLASMAS; SILVER COMPOUNDS; TIN COMPOUNDS; TITANIUM DIOXIDE; X RAY PHOTOELECTRON SPECTROSCOPY;

DEPOSITION RATE; OXIDE FILMS; PLASMA REACTIVITY; REACTIVE SPUTTERING; RF COIL AMPLIFICATION; SUBSTRATE OXIDATION;

SPUTTER DEPOSITION;

COATING;

EID: 24644457641     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2005.02.067     Document Type: Article

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