Comparison of the ionisation efficiency in a microwave and a radio-frequency assisted magnetron discharge

Surface and Coatings Technology

Volumn 200, Issue 1-4 SPEC. ISS., 2005, Pages 800-803

  de Poucques, Ludovic ^a   Imbert, J C ^a   Vasina, P ^b   Boisse Laporte, C ^a   Teule Gay L ^a   Bretagne, J ^a   Touzeau, M ^a  

^a UNIVERSITÉ PARIS SUD   (France)

^b Department of Physical Electronics ^*  (Czech Republic)

Author keywords

Absorption spectroscopy; IPVD; Microwave discharge; RF discharge; Sputtering

Indexed keywords

ABSORPTION SPECTROSCOPY; IONIZATION; LIGHT ABSORPTION; MAGNETRON SPUTTERING; MICROWAVE ANTENNAS; PLASMA PROBES;

IONISED PHYSICAL VAPOUR DEPOSITION (IPVD); LANGMUIR PROBE; MICROWAVE DISCHARGE; RF DISCHARGE;

PHYSICAL VAPOR DEPOSITION;

COATING;

EID: 24644497171     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2005.03.046     Document Type: Article

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