The effect of argon on the structure of amorphous SiBCN materials: An experimental and ab initio study

Journal of Physics Condensed Matter

Volumn 18, Issue 7, 2006, Pages 2337-2348

  Houska, J ^a,b   Warschkow, O ^a   Bilek, M M M ^a   McKenzie, D R ^a   Vlcek, J ^b   Potocky, S ^b  

^a UNIVERSITY OF SYDNEY   (Australia)

^b UNIVERSITY OF WEST BOHEMIA   (Czech Republic)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; COMPUTER SIMULATION; MAGNETRON SPUTTERING; MOLECULAR DYNAMICS; MOLECULAR STRUCTURE; SILICON COMPOUNDS;

ARGON ATOMS; RELATIVE STRESS; VICINITY;

AMORPHOUS MATERIALS;

EID: 32144460867     PISSN: 09538984     EISSN: 1361648X     Source Type: Journal    
DOI: 10.1088/0953-8984/18/7/019     Document Type: Article

References (34)

1. Ramakrishnan P A, Wang Y T, Balzar D, An L, Haluschka C, Riedel R and Hermann A M 2001 Appl. Phys. Lett. 78 3076
2. Baufeld B, Gu H, Bill J, Wakai F and Aldinger F 1999 J. Eur. Ceram. Soc. 19 2797
3. Jungermann H and Jansen M 1999 Mater. Res. Innovat. 2 200
4. Riedel R, Kienzle A, Dressler W, Ruwisch L, Bill J and Aldinger F 1996 Nature 386 796
5. Schmidt S, Borchardt G, Weber S, Scherrer H, Baumann H, Müller A and Bill J 2002 J. Non-Cryst. Solids 298 232
6. Müller A, Gerstel P, Weinmann M, Bill J and Aldinger F 2000 J. Eur. Ceram. Soc. 20 2655
7. Müller A, Gerstel P, Weinmann M, Bill J and Aldinger F 2001 J. Eur. Ceram. Soc. 21 2171
8. Müller A, Zern A, Gerstel P, Bill J and Aldinger F 2002 J. Eur. Ceram. Soc. 22 1631
9. Lu L, Song Y C and Feng C X 1998 J. Mater. Sci. Lett. 17 599
10. Butchereit E and Nickel K G 2001 J. Am. Ceram. Soc. 84 2184
11. Riedel R, Ruwisch L M, An L and Raj R 1998 J. Am. Ceram. Soc. 81 3341
12. Hegemann D, Riedel R and Oehr C 1999 Chem. Vapor Depos. 5 61
13. Hegemann D, Oehr C and Riedel R 1999 Proc. 14th Int. Symp. Plasma Chemistry (Prague) vol 3 ed M Hrabovsky et al p 1573
14. Rooke M A and Sherwood P M A 1997 Chem. Mater. 9 285
15. Vlcek J, Potocky S, Cizek J, Houska J, Kormunda M, Zeman P, Perina V, Zemek J, Setsuhara Y and Kumagai M 2005 J. Vac. Sci. Technol. A 23 1513
16. Sproul W D et al (ed) 1986 Physics and Chemistry of Protective Coatings (New York: American Institute of Physics) pp 56-8
17. Davis C A 1993 Thin Solid Films 226 30
18. Ulrich S, Theel T, Schwan J and Ehrhardt H 1997 Surf. Coat. Technol. 97 45
19. CPMD, Copyright IBM Corp. 1990-2005 Copyright MPI für Festkörperförschung Stuttgart 1997-2005
20. Becke A D 1988 Phys. Rev. A 38 3098
21. Lee C, Yang W and Parr R G 1988 Phys. Rev. B 37 785
22. Goedecker S, Teter M and Hutter J 1996 Phys. Rev. B 54 1703
23. Troullier N and Martins J L 1991 Phys. Rev. B 43 1993
24. Houska J, Bilek M M M, Warschkow O, McKenzie D R and Vlcek J 2005 Phys. Rev. B 72 054204
25. Marks N A 1997 Phys. Rev. B 56 2441
26. Marks N A, Cooper N C, McKenzie D R, McCulloch D G, Bath P and Russo S P 2002 Phys. Rev. B 65 75411
27. McCulloch D G, McKenzie D R and Goringe C M 2000 Phys. Rev. B 61 2349
28. Bilek M M M, McKenzie D R, McCulloch D G and Goringe C M 2000 Phys. Rev. B 62 3071
29. Merchant A R, McKenzie D R and McCulloch D G 2001 Phys. Rev. B 65 24208
30. McCulloch D G, McKenzie D R and Goringe C M 2000 J. Appl. Phys. 88 5028
31. Fitzhenry P, Bilek M M M, Marks N A, Cooper N C and McKenzie D R 2003 J. Phys.: Condens. Matter 15 165
32. Houska J et al 2005 Mol. Simul. submitted
33. Gunnars J and Wiklund U 2002 Mater. Sci. Eng. A 336 7
34. Franzblau D S 1991 Phys. Rev. B 44 4925