The effects of capacitor termination at an internal ICP antenna on the power coupling, plasma parameters and impurity incorporation

Surface and Coatings Technology

Volumn 201, Issue 9-11 SPEC. ISS., 2007, Pages 5442-5445

  Kim, J N ^a   Lee, H Y ^a   Lee, D K ^a   Lee, J J ^a  

^a Seoul National University   (South Korea)

Author keywords

Blocking capacitor; Impurity; Internal ICP; Plasma density

Indexed keywords

ANTENNAS; CAPACITANCE; IMPURITIES; INDUCTIVELY COUPLED PLASMA; PLASMA DENSITY; SPUTTERING; SUBSTRATES;

BLOCKING CAPACITOR; PLASMA PARAMETER; POWER COUPLING;

CAPACITORS;

ANTENNAS; CAPACITANCE; CAPACITORS; IMPURITIES; INDUCTIVELY COUPLED PLASMA; PLASMA DENSITY; SPUTTERING; SUBSTRATES;

EID: 33846531132     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2006.07.019     Document Type: Article

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