Mechanisms of intrinsic stress generation in amorphous carbon thin films prepared by magnetron sputtering

Diamond and Related Materials

Volumn 6, Issue 9, 1997, Pages 1182-1191

  Mounier, E ^a   Pauleau, Y ^a,b  

^a CEA GRENOBLE   (France)

^b GRENOBLE INSTITUTE OF TECHNOLOGY   (France)

Author keywords

Amorphous carbon; Intrinsic stress; Magnetron sputtering; Mass density

Indexed keywords

EID: 0042543840     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0925-9635(97)00025-3     Document Type: Article

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