Approach for VUV positive resists using photodecomposable polymers

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3999 (I), Issue , 2000, Pages 347-356

  Kishimura, Shinji ^a   Katsuyama, Akiko ^a   Sasago, Masaru ^a   Shirai, Masamitsu ^a   Tsunooka, Masahiro ^a  

^a PANASONIC CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CROSSLINKING; DEGASSING; DISSOLUTION; EXCIMER LASERS; POLYACRYLATES; POLYMERS; POLYSTYRENES; VACUUM APPLICATIONS;

PHOTODECOMPOSABLE POLYMERS; VACUUM ULTRAVIOLET;

PHOTORESISTS;

EID: 0033691970     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.388318     Document Type: Conference Paper

References (12)