-
1
-
-
35148815282
-
Pitch doubling through dual patterning lithography challenges in integration and litho budgets
-
M. Dusa, J. Quaedackers, O. Larsen, J. Meessen, E. van der Heijden, G. Dicker, O. Wismans, P. de Haas, K. van Ingen Schenau, J. Finders, B. Vleeming, G. Storms, P. Jaenen, S. Cheng, M. Maenhoudt, "Pitch doubling through dual patterning lithography challenges in integration and litho budgets", Proc. SPIE, 6520, 65200G, 2007.
-
(2007)
Proc. SPIE
, vol.6520
-
-
Dusa, M.1
Quaedackers, J.2
Larsen, O.3
Meessen, J.4
van der Heijden, E.5
Dicker, G.6
Wismans, O.7
de Haas, P.8
van Ingen Schenau, K.9
Finders, J.10
Vleeming, B.11
Storms, G.12
Jaenen, P.13
Cheng, S.14
Maenhoudt, M.15
-
2
-
-
33745777382
-
Positive and negative tone double patterning lithography for 50nm flash memory
-
Chang-Moon Lim, Seo-Min Kim, Young-Sun Hwang, Jae-Seung Choi, Keun-Do Ban, Sung-Yoon Cho, Jin-Ki Jung, Eung-Kil Kang, Hee-Youl Lim, Hyeong-Soo Kim, and Seung-Chan Moon, "Positive and negative tone double patterning lithography for 50nm flash memory", Proc. SPIE, 6154, 615410, 2006.
-
(2006)
Proc. SPIE
, vol.6154
, pp. 615410
-
-
Lim, C.-M.1
Kim, S.-M.2
Hwang, Y.-S.3
Choi, J.-S.4
Ban, K.-D.5
Cho, S.-Y.6
Jung, J.-K.7
Kang, E.-K.8
Lim, H.-Y.9
Kim, H.-S.10
Moon, S.-C.11
-
3
-
-
25144436878
-
Double patterning scheme for sub-0.25 k1single damascene structures at NA=0.75, λ=193nm
-
M. Maenhoudt, J. Versluijs, H. Struyf, J. Van Olmen, M. Van Hove, "Double patterning scheme for sub-0.25 k1single damascene structures at NA=0.75, λ=193nm", Proc. SPIE, 5754, p. 1508-1518, 2005.
-
(2005)
Proc. SPIE
, vol.5754
, pp. 1508-1518
-
-
Maenhoudt, M.1
Versluijs, J.2
Struyf, H.3
Van Olmen, J.4
Van Hove, M.5
-
4
-
-
33745795739
-
Patterning with spacer for expanding the resolution limit of current lithography tool
-
Woo-Yung Jung, Choi-Dong Kim, Jae-Doo Eom, Sung-Yoon Cho, Sung-Min Jeon, Jong-Hoon Kim, Jae-In Moon, Byung-Seok Lee, and Sung-Ki Park, "Patterning with spacer for expanding the resolution limit of current lithography tool", Proc. SPIE, 6156, 61561J, 2006.
-
(2006)
Proc. SPIE
, vol.6156
-
-
Jung, W.-Y.1
Kim, C.-D.2
Eom, J.-D.3
Cho, S.-Y.4
Jeon, S.-M.5
Kim, J.-H.6
Moon, J.-I.7
Lee, B.-S.8
Park, S.-K.9
-
5
-
-
45449087688
-
-
International Technology Roadmap for semiconductors, 2007, http://www.itrs.net/Links/2007ITRS/2007_Chapters/2007_Lithography.pdf
-
(2007)
-
-
-
6
-
-
0033356184
-
Sub-100nm Lithography with KrF exposure using multiple development method
-
M. Asano, "Sub-100nm Lithography with KrF exposure using multiple development method", Jpn. J. Appl. Phys. Vol. 38, (1999), 6999-7003.
-
(1999)
Jpn. J. Appl. Phys
, vol.38
, pp. 6999-7003
-
-
Asano, M.1
-
7
-
-
43249111394
-
Development of materials and processes for 32 nm node immersion lithography process
-
Keystone, Colorado, October 8-11
-
S. Tarutani, H. Tsubaki, M. Yoshidome, K. Wada, W. Hoshino, S. Kanna, N. Nishikawa, K. Mizutani, N. Oshima, K. Shibatake 'Development of materials and processes for 32 nm node immersion lithography process' 4th International Symposium on Immersion Lithography, Keystone, Colorado, October 8-11, 2007.
-
(2007)
4th International Symposium on Immersion Lithography
-
-
Tarutani, S.1
Tsubaki, H.2
Yoshidome, M.3
Wada, K.4
Hoshino, W.5
Kanna, S.6
Nishikawa, N.7
Mizutani, K.8
Oshima, N.9
Shibatake, K.10
-
8
-
-
45449085394
-
-
S. Tarutani et al., Proc SPIE, 6923, 6923-14, 2008.
-
(2008)
Proc SPIE
, vol.6923
, pp. 6923-7014
-
-
Tarutani, S.1
-
9
-
-
51549115631
-
-
M. Hori et al., Proc. SPIE, 6923, 6923-17, 2008.
-
(2008)
Proc. SPIE
, vol.6923
, pp. 6923-7017
-
-
Hori, M.1
-
10
-
-
45449120790
-
-
Martin Drapeau, et al., Double patterning design split implementation and validation fro the 32-nm node, SPIE 6521-07, 2007.
-
Martin Drapeau, et al., "Double patterning design split implementation and validation fro the 32-nm node", SPIE 6521-07, 2007.
-
-
-
-
11
-
-
35148841978
-
Double patterning EDA solutions for the 32-nm HP and beyond
-
George Bailey, et al., "Double patterning EDA solutions for the 32-nm HP and beyond", SPIE 6521-57, 2007.
-
(2007)
SPIE
, vol.6521 -57
-
-
Bailey, G.1
-
12
-
-
45449095473
-
Split and design guidelines for double patterning
-
V. Wiaux, S. Verhaegen, S. Cheng, P. Jaenen, M. Maenhoudt, G. Vandenberghe, T. Matsuda, F. Iwamoto, and S. Postnikov, "Split and design guidelines for double patterning", Proc. SPIE, 6924, 692408, 2008.
-
(2008)
Proc. SPIE
, vol.6924
, pp. 692408
-
-
Wiaux, V.1
Verhaegen, S.2
Cheng, S.3
Jaenen, P.4
Maenhoudt, M.5
Vandenberghe, G.6
Matsuda, T.7
Iwamoto, F.8
Postnikov, S.9
|